SCHEMBL18485657

SCHEMBL18485657

O=S(=O)(O)C(F)(F)CCCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 3/20 0.43
GRIN3B O60391 3/20 0.43
GRIN1 Q05586 3/20 0.43
GRIN2A Q12879 3/20 0.43
GRIN2B Q13224 3/20 0.43
GRIN2C Q14957 3/20 0.43
GRIN3A Q8TCU5 3/20 0.43
EPHX2 P34913 9/20 0.42
GRM2 Q14416 1/20 0.36
GRM3 Q14832 1/20 0.36
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA9 Q16790 1/20 0.33
ALDH1A1 P00352 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18346697 0.90 EPHX2 (0.41) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL15935697 0.80 GRIN2D (0.42) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL3790410 0.79 ALDH1A1 (0.36) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL3785565 0.77 ALDH1A1 (0.35) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL17231130 0.77 EPHX2 (0.36) EPHX2GRM2GRM3MEN1KMT2A
SCHEMBL27436716 0.76 GRIN2D (0.54) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL18068664 0.75 EPHX2 (0.39) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL16000731 0.74 GRIN2D (0.40) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL21397001 0.73 GRM2 (0.39) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL18472009 0.73 GRIN2D (0.50) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170038685-A1 ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING COMPOSITION, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-02-09 US disclosed