SCHEMBL3785565

SCHEMBL3785565

O=S(=O)(O)C(F)(F)CC12CC3CC(CC(C3)C1)C2.[NaH]

nearest known ligand 0.35

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.35
TSHR P16473 1/20 0.35
EPHX2 P34913 8/20 0.35
GRIN2D O15399 1/20 0.34
GRIN3B O60391 1/20 0.34
GRIN1 Q05586 1/20 0.34
GRIN2A Q12879 1/20 0.34
GRIN2B Q13224 1/20 0.34
GRIN2C Q14957 1/20 0.34
GRIN3A Q8TCU5 1/20 0.34
EPHX1 P07099 1/20 0.33
HSD17B10 Q99714 1/20 0.33
BPTF Q12830 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3790410 0.98 ALDH1A1 (0.36) ALDH1A1TSHREPHX2GRIN2DGRIN3B
SCHEMBL23640669 0.89 HSD11B1 (0.32) ALDH1A1TSHREPHX2
SCHEMBL12308108 0.84 EPHX2 (0.37) TSHREPHX2
SCHEMBL3733833 0.82 MAPT (0.44) ALDH1A1
SCHEMBL16330887 0.81 P2RX7 (0.40) EPHX2
SCHEMBL20086266 0.81 GRIN2D (0.37) ALDH1A1TSHREPHX2GRIN2DGRIN3B
SCHEMBL18346697 0.80 EPHX2 (0.41) ALDH1A1TSHREPHX2GRIN2DGRIN3B
SCHEMBL26190781 0.79 SCN9A (0.36) ALDH1A1TSHRGRIN2DGRIN3BGRIN1
SCHEMBL12455715 0.78
SCHEMBL3785562 0.78 GRIN2D (0.34) ALDH1A1TSHREPHX2GRIN2DGRIN3B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8440384-B2 Compound, salt, and radiation-sensitive resin composition JSR CORPORATION (JP) 2013-05-14 US disclosed
US-20130045446-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN AND SULFONIUM COMPOUND JSR CORPORATION (JP) 2013-02-21 US disclosed
US-20100221659-A1 COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100221659-A1 COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION AFF1, RER1, AFF4 ALDH1A1 3298/4885TSHR 1006/4885EPHX2 3205/4885
US-20130045446-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN AND SULFONIUM COMPOUND RAD51, RER1, SEM1 ALDH1A1 3067/4885TSHR 2228/4885EPHX2 3177/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.