⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL115447 | 0.82 | CYP3A4 (0.33) | — | |
| SCHEMBL163399 | 0.73 | ALDH1A1 (0.38) | — | |
| SCHEMBL11973102 | 0.72 | — | — | |
| SCHEMBL14777412 | 0.71 | — | — | |
| SCHEMBL11972848 | 0.70 | ALDH1A1 (0.41) | — | |
| SCHEMBL2761711 | 0.69 | MEN1 (0.32) | — | |
| SCHEMBL339179 | 0.68 | LMNA (0.36) | — | |
| SCHEMBL183516 | 0.67 | ALDH1A1 (0.35) | — | |
| SCHEMBL41140 | 0.67 | ALDH1A1 (0.42) | — | |
| SCHEMBL38202 | 0.67 | ALDH1A1 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240122065-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | TOSOH CORPORATION (JP) | 2024-04-11 | — | — | US | claimed |
| EP-4198163-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | Tosoh Corporation (JP) | 2023-06-21 | — | — | EP | claimed |
| US-7456310-B2 | Dispersant for dispersing carbon nanotubes and carbon nanotube composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-11-25 | — | — | US | claimed |
| US-20070221094-A1 | DISPERSANT FOR DISPERSING CARBON NANOTUBES AND CARBON NANOTUBE COMPOSITION COMPRISING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-09-27 | — | — | US | claimed |
| US-12013636-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-18 | — | — | US | disclosed |
| US-20240122065-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | TOSOH CORPORATION (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20240117101-A1 | COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, COMPOSITION FOR OPTICAL MEMBER FORMATION, RESIN FOR UNDERLAYER FILM FORMATION, RESIST RESIN, RADIATION-SENSITIVE RESIN, AND RESIN FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20240117102-A1 | POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20240114778-A1 | ORGANIC ELECTROLUMINESCENT COMPOUND, A PLURALITY OF HOST MATERIALS, AND ORGANIC ELECTROLUMINESCENT DEVICE COMPRISING THE SAME | DUPONT SPECIALTY MATERIALS KOREA LTD. (KR) | 2024-04-04 | — | — | US | disclosed |
| CN-117624071-A | Organic electroluminescent compound, various host materials, and organic electroluminescent device comprising the same | 罗门哈斯电子材料韩国有限公司 | 2024-03-01 | — | — | CN | disclosed |
| US-20230314942-A1 | POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230296982-A1 | POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20030013774-A1 | Ion exchange polymer dispersion and process for its production | ASAHI GLASS COMPANY, LIMITED (JP) | 2003-01-16 | — | — | US | disclosed |
| EP-1263074-A1 | Ion exchange polymer dispersion and process for its production | Asahi Glass Co., Ltd. (JP) | 2002-12-04 | — | — | EP | disclosed |
| EP-0915865-B1 | COVALENTLY IMMOBILISED FLUOROIONOPHORES FOR OPTICAL ION SENSORS | NOVARTIS AG (CH) | 2002-02-20 | — | — | EP | disclosed |
| US-6294390-B1 | COMPOUND CONSISTING OF IONOPHORE, FLUOROPHORE, AND A FUNCTIONAL GROUP BOUND TOGETHER THROUGH A TRIVALENT ORGANIC RADICAL; SENSORS HAVING LONG USABLE LIFE AND A HIGH DEGREE OF SENSITIVITY | NOVARTIS AG (CH) | 2001-09-25 | — | — | US | disclosed |
| EP-0915865-A1 | COVALENTLY IMMOBILISED FLUOROIONOPHORES FOR OPTICAL ION SENSORS | Novartis AG (CH) | 1999-05-19 | — | — | EP | disclosed |
| WO-1998003497-A1 | COVALENTLY IMMOBILISED FLUOROIONOPHORES FOR OPTICAL ION SENSORS | NOVARTIS AG (CH) | 1998-01-29 | — | — | WO | disclosed |
| US-5081091-A | For obtaining high molecular weight/narrow distribution addition homo- and copolymers by controlled bulk polymerization; silicon, germanium or tin organic compounds; cocatalysts | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1992-01-14 | — | — | US | disclosed |
| EP-0405787-A2 | Catalysts | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1991-01-02 | — | — | EP | disclosed |