SCHEMBL18503872

SCHEMBL18503872

Cc1ccc(S(=O)(=O)C2(C(=O)O)CC2)cc1C

nearest known ligand 0.88

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.48
ALDH1A1 P00352 7/20 0.47
LMNA P02545 2/20 0.46
TDP1 Q9NUW8 1/20 0.46
HTT P42858 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
GAA P10253 1/20 0.42
HPGD P15428 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
PKM P14618 1/20 0.41
POLB P06746 2/20 0.40
TP53 P04637 1/20 0.40
TSHR P16473 1/20 0.40
MAPT P10636 1/20 0.40
YAP1 P46937 1/20 0.40
TEAD4 Q15561 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27183093 0.75 KMT2A (0.61) THRBALDH1A1SMN1; SMN2HPGDNPSR1
SCHEMBL3936342 0.74 GAA (0.53) ALDH1A1HTTSMN1; SMN2GAAHPGD
SCHEMBL351726 0.74 EEF2K (0.58) ALDH1A1LMNAHTTSMN1; SMN2GAA
SCHEMBL13822796 0.74 ALDH1A1 (0.56) ALDH1A1HPGDNPSR1POLBTP53
SCHEMBL23049684 0.73 CA2 (0.46) THRBALDH1A1LMNAHTTSMN1; SMN2
SCHEMBL1464281 0.70 MMP2 (0.51) MAPT
SCHEMBL31645290 0.69 ALDH1A1 (0.39) THRBALDH1A1SMN1; SMN2HPGDNPSR1
SCHEMBL27182591 0.68 GAA (0.60) HTTGAAMAPT
SCHEMBL27182598 0.68 GAA (0.55) HTTGAAMAPT
SCHEMBL16880400 0.68 PHGDH (0.51) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230341777-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINAL-BLOCKED REACTION PRODUCT NISSAN CHEMICAL CORPORATION (JP) 2023-10-26 US disclosed
US-20230341777-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINAL-BLOCKED REACTION PRODUCT NISSAN CHEMICAL CORPORATION (JP) 2023-10-26 US disclosed
US-20230296984-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230296984-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230259028-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS NISSAN CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
US-20230259028-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS NISSAN CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
US-9910354-B2 Resist underlayer film-forming composition and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-03-06 US disclosed
US-9910354-B2 Resist underlayer film-forming composition and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-03-06 US disclosed
US-20170045820-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-02-16 US disclosed
US-20170045820-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-02-16 US disclosed