SCHEMBL18513397

SCHEMBL18513397

O=C(O)c1ccc2cc(S(=O)(=O)C(F)(F)F)ccc2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 3/20 0.53
ALDH1A1 P00352 2/20 0.46
KDM4E B2RXH2 1/20 0.45
POLB P06746 1/20 0.43
EPAS1 Q99814 1/20 0.43
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA3 P07451 1/20 0.42
CA6 P23280 1/20 0.42
CYP2C19 P33261 1/20 0.42
CA5A P35218 1/20 0.42
CA7 P43166 1/20 0.42
CA9 Q16790 1/20 0.42
CA14 Q9ULX7 1/20 0.42
CA5B Q9Y2D0 1/20 0.42
CDC25B P30305 1/20 0.41
PLA2G2D Q9UNK4 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18503828 0.83 KDM4E (0.49) PTPN1ALDH1A1KDM4ECA12CA1
SCHEMBL1018442 0.82 CA1 (0.55) ALDH1A1KMT2ACA12CA1CA2
SCHEMBL7286109 0.81 EPAS1 (0.48) ALDH1A1KDM4EPOLBEPAS1MEN1
SCHEMBL18503854 0.81 PTPN1 (0.49) PTPN1ALDH1A1KDM4EKMT2ACA12
SCHEMBL18513447 0.80 PTPN1 (0.40) PTPN1ALDH1A1CYP2C19CDC25BPLA2G2D
SCHEMBL20656774 0.80 ALDH1A1 (0.57) PTPN1ALDH1A1POLBEPAS1MEN1
SCHEMBL29937265 0.79 F2 (0.53) ALDH1A1KDM4EPOLBMEN1KMT2A
SCHEMBL1449037 0.79 F2 (0.53) ALDH1A1KDM4EPOLBMEN1KMT2A
SCHEMBL11141741 0.79 LCK (0.53) PTPN1ALDH1A1KDM4EKMT2ACA12
SCHEMBL7197925 0.78 ALDH1A1 (0.59) PTPN1ALDH1A1POLBEPAS1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230341777-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINAL-BLOCKED REACTION PRODUCT NISSAN CHEMICAL CORPORATION (JP) 2023-10-26 US disclosed
US-20230296984-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230259028-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS NISSAN CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
US-9910354-B2 Resist underlayer film-forming composition and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-03-06 US disclosed
US-20170045820-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-02-16 US disclosed