Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.56 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 1/20 | 0.54 |
| ▸ | POLB | P06746 | 1/20 | 0.54 |
| ▸ | ATM | Q13315 | 2/20 | 0.48 |
| ▸ | ACHE | P22303 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | DRD1 | P21728 | 1/20 | 0.42 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.41 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.40 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11356640 | 0.80 | ATM (0.66) | MAPTCYP3A4TDP1LMNAPOLB | |
| SCHEMBL14823523 | 0.77 | LMNA (0.57) | MAPTCYP3A4TDP1LMNAPOLB | |
| SCHEMBL10792005 | 0.74 | NQO2 (0.45) | MAPTCYP3A4TDP1LMNAPOLB | |
| SCHEMBL2138785 | 0.73 | CYP3A4 (1.00) | MAPTCYP3A4ACHEKDM4EDRD1 | |
| SCHEMBL29394312 | 0.73 | CYP3A4 (1.00) | MAPTCYP3A4ACHEKDM4EDRD1 | |
| SCHEMBL25591699 | 0.73 | CYP3A4 (0.78) | MAPTCYP3A4ATMACHEKDM4E | |
| SCHEMBL4571013 | 0.73 | CYP3A4 (1.00) | MAPTCYP3A4ACHEKDM4EDRD1 | |
| SCHEMBL29460958 | 0.73 | CYP3A4 (0.78) | MAPTCYP3A4ATMACHEKDM4E | |
| SCHEMBL22953335 | 0.73 | CYP3A4 (1.00) | MAPTCYP3A4ACHEKDM4EDRD1 | |
| SCHEMBL18537279 | 0.72 | CYP3A4 (0.48) | MAPTCYP3A4TDP1LMNAPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3141958-A2 | CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD | JSR Corporation (JP) | 2017-03-15 | — | — | EP | disclosed |
| EP-3133444-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND | OSAKA UNIVERSITY (JP) | 2017-02-22 | — | — | EP | disclosed |