SCHEMBL18535985

SCHEMBL18535985

CC(C)Oc1cc(OC(C)(C)I)ccc1C(O)c1ccc(OC(C)(C)C)cc1OC(C)(C)C

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 1/20 0.33
▸ GAA P10253 1/20 0.33
▸ MCL1 Q07820 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18287941 0.94 POLB (0.35) POLBGAA
SCHEMBL18539401 0.92 POLB (0.36) POLBGAAMCL1
SCHEMBL18535987 0.86 RXRA (0.31) POLBGAA
SCHEMBL18840679 0.85 KIF11 (0.37) POLBGAA
SCHEMBL18536999 0.83 ACACB (0.36) POLBGAA
SCHEMBL22839358 0.75 GAA (0.32) POLBGAA
SCHEMBL18536997 0.75 GAA (0.32) POLBGAA
SCHEMBL18639661 0.73 — —
SCHEMBL18535762 0.71 GAA (0.33) POLBGAA
SCHEMBL18535763 0.68 SLC6A2 (0.32) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3133444-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND OSAKA UNIVERSITY (JP) 2017-02-22 — — EP disclosed
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