SCHEMBL18840679

SCHEMBL18840679

CC(C)(C)Oc1ccc(C(O)c2ccc(OC(C)(C)C)cc2OC(C)(C)C)c(OC(C)(C)C)c1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KIF11 P52732 1/20 0.37
▸ POLB P06746 1/20 0.34
▸ GAA P10253 1/20 0.34
▸ SCN1A P35498 1/20 0.33
▸ SCN2A Q99250 1/20 0.33
▸ SCN3A Q9NY46 1/20 0.33
▸ ELANE P08246 2/20 0.33
▸ ABL1 P00519 1/20 0.31
▸ ACACB O00763 1/20 0.31
▸ SLC6A2 P23975 1/20 0.31
▸ SLC6A4 P31645 1/20 0.31
▸ SLC6A3 Q01959 1/20 0.31
▸ ADRA2A P08913 2/20 0.31
▸ ADRA1A P35348 2/20 0.31
▸ CYP2D6 P10635 2/20 0.30
▸ MEN1 O00255 1/20 0.30
▸ CYP1A2 P05177 1/20 0.30
▸ CYP3A4 P08684 1/20 0.30
▸ MAPT P10636 1/20 0.30
▸ CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18287941 0.91 POLB (0.35) KIF11POLBGAASCN1ASCN2A
SCHEMBL18539401 0.86 POLB (0.36) KIF11POLBGAASCN1ASCN2A
SCHEMBL18535985 0.85 POLB (0.33) POLBGAA
SCHEMBL18535987 0.82 RXRA (0.31) POLBGAA
SCHEMBL18536999 0.78 ACACB (0.36) KIF11POLBGAASCN1ASCN2A
SCHEMBL30903832 0.78 GPR3 (0.42) KIF11GAASCN2ASLC6A2SLC6A3
SCHEMBL3824427 0.76 KIF11 (0.43) KIF11ELANEABL1SLC6A2SLC6A4
SCHEMBL31376356 0.75 TMEM97 (0.40) KIF11GAAMEN1MAPTKMT2A
SCHEMBL18287906 0.75 KIF11 (0.33) KIF11
SCHEMBL18287903 0.75 CHRM2 (0.37) POLBELANESLC6A2CYP2D6CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10018911-B2 Chemically amplified resist material and resist pattern-forming method JSR CORPORATION (JP) 2018-07-10 — — US disclosed
US-10018911-B2 Chemically amplified resist material and resist pattern-forming method JSR CORPORATION (JP) 2018-07-10 — — US disclosed
US-20170131633-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-05-11 — — US disclosed
US-20170131633-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-05-11 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10018911-B2 Chemically amplified resist material and resist pattern-forming method SLC11A2, XRCC5, RAD54L KIF11 4553/4885POLB 48/4885GAA 1554/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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