SCHEMBL18574474

SCHEMBL18574474

COc1cc(C(C)(C)CC(C)I)ccc1O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B2 P37059 2/20 0.46
FOS P01100 1/20 0.46
TTR P02766 1/20 0.46
JUN P05412 1/20 0.46
NR3C1 P04150 1/20 0.46
HSD17B1 P14061 1/20 0.46
MAOB P27338 1/20 0.43
ALOX15 P16050 1/20 0.43
ALOX12 P18054 1/20 0.43
CYP3A4 P08684 2/20 0.42
TSHR P16473 2/20 0.42
NFKB1 P19838 1/20 0.41
MMP1 P03956 1/20 0.41
TMEM97 Q5BJF2 1/20 0.41
TAAR1 Q96RJ0 2/20 0.41
MAPK1 P28482 1/20 0.41
SLC22A3 O75751 1/20 0.40
BLM P54132 1/20 0.40
PMP22 Q01453 1/20 0.40
LMNA P02545 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23366127 0.82 ALOX15 (0.52) HSD17B2FOSTTRJUNNR3C1
SCHEMBL3436061 0.79 MAOB (0.50) HSD17B2FOSTTRJUNNR3C1
SCHEMBL27602008 0.78 CNR2 (0.48) HSD17B2FOSTTRJUNNR3C1
SCHEMBL27800149 0.78 TSHR (0.53) HSD17B2FOSTTRJUNNR3C1
SCHEMBL20942165 0.76 CNR2 (0.52) HSD17B2MAOBTSHRTAAR1MAPK1
SCHEMBL23057414 0.76 MAOB (0.50) HSD17B2FOSTTRJUNNR3C1
SCHEMBL22566844 0.75 MAOB (0.55) MAOBTSHRTAAR1MAPK1
SCHEMBL21103925 0.75 HSP90AA1 (0.41) MAOBALOX15ALOX12MAPK1LMNA
SCHEMBL125447 0.75 MAOB (0.57) FOSTTRJUNNR3C1MAOB
SCHEMBL29431900 0.75 MAOB (0.57) FOSTTRJUNNR3C1MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10545405-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2020-01-28 US disclosed
US-20170351176-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-12-07 US disclosed
US-20170059990-A1 RADIATION-SENSITIVE OR ACTINIC RAY-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, MASK BLANK, RESIST PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-03-02 US disclosed