SCHEMBL23366127

SCHEMBL23366127

CC(I)CC(C)(C)c1ccc(O)c(O)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 4/20 0.52
ALDH1A1 P00352 4/20 0.52
HPGD P15428 3/20 0.52
HSD17B10 Q99714 3/20 0.52
TDP1 Q9NUW8 2/20 0.52
ESR1 P03372 8/20 0.43
RORC P51449 1/20 0.41
ALOX12 P18054 3/20 0.39
CNR1 P21554 3/20 0.39
CYP3A4 P08684 3/20 0.39
HIF1A Q16665 3/20 0.39
MEN1 O00255 3/20 0.39
RECQL P46063 3/20 0.39
KMT2A Q03164 3/20 0.39
KDM4E B2RXH2 2/20 0.39
TP53 P04637 2/20 0.39
MAPK1 P28482 2/20 0.39
CYP2D6 P10635 2/20 0.39
AR P10275 2/20 0.39
MAPT P10636 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18574379 0.85 ALOX15 (0.55) ALOX15ALDH1A1HPGDHSD17B10TDP1
SCHEMBL18574474 0.82 HSD17B2 (0.46) ALOX15ALOX12CYP3A4MAPK1LMNA
SCHEMBL21103925 0.81 HSP90AA1 (0.41) ALOX15ALDH1A1HPGDTDP1RORC
SCHEMBL18574477 0.79 SHBG (0.53) ALDH1A1HPGDHSD17B10ESR1CYP3A4
SCHEMBL10583934 0.79 TDP1 (0.52) ALOX15ALDH1A1HPGDHSD17B10TDP1
SCHEMBL56223 0.75 ALDH1A1 (0.61) ALOX15ALDH1A1HPGDHSD17B10TDP1
SCHEMBL68434 0.73 SHBG (0.61) ALOX15ALDH1A1HPGDHSD17B10TDP1
SCHEMBL29457570 0.73 SHBG (0.61) ALOX15ALDH1A1HPGDHSD17B10TDP1
SCHEMBL22827348 0.71 SLC6A2 (0.36) CYP3A4MAPTSLC6A2RAB9ASLC6A3
SCHEMBL50705 0.69 ALDH1A1 (1.00) ALOX15ALDH1A1HPGDHSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11009791-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2021-05-18 US disclosed