Known targets — ChEMBL curated mechanism
ADRB1CDK4CDK6CHRM2CHRM3DPP4DRD2DRD3DRD4EGFRHRH1HTR1BHTR1DHTR1FHTR2AHTR2CHTR4SLC6A2SLC6A4
The experimentally established mechanism targets of Succinic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 5/20 | 0.64 |
| ▸ | EGLN1 | Q9GZT9 | 3/20 | 0.64 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.64 |
| ▸ | SUCNR1 | Q9BXA5 | 1/20 | 0.64 |
| ▸ | APEX1 | P27695 | 1/20 | 0.53 |
| ▸ | GABRR1 | P24046 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.48 |
| ▸ | KDM5C | P41229 | 2/20 | 0.48 |
| ▸ | PHF8 | Q9UPP1 | 2/20 | 0.48 |
| ▸ | KDM2A | Q9Y2K7 | 2/20 | 0.48 |
| ▸ | OR51E2 | Q9H255 | 2/20 | 0.47 |
| ▸ | SLC15A2 | Q16348 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | SLC13A3 | Q8WWT9 | 1/20 | 0.47 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 3/20 | 0.45 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.45 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.45 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.45 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Succinic Acid SCHEMBL11335766 | 0.90 | LMNA (0.60) | LMNAEGLN1ALKBH5SUCNR1APEX1 | |
| Succinic Acid SCHEMBL27383830 | 0.90 | LMNA (0.60) | LMNAEGLN1ALKBH5SUCNR1APEX1 | |
| Succinic Acid SCHEMBL8843774 | 0.87 | LMNA (0.56) | LMNAEGLN1ALKBH5SUCNR1APEX1 | |
| Succinic Acid SCHEMBL28320472 | 0.84 | LMNA (0.53) | LMNAEGLN1ALKBH5SUCNR1APEX1 | |
| Succinic Acid SCHEMBL285597 | 0.81 | LMNA (0.69) | LMNAEGLN1ALKBH5SUCNR1APEX1 | |
| Succinic Acid SCHEMBL7752977 | 0.81 | LMNA (0.82) | LMNAEGLN1ALKBH5SUCNR1GABRR1 | |
| Succinic Acid SCHEMBL27804789 | 0.81 | LMNA (0.82) | LMNAEGLN1ALKBH5SUCNR1GABRR1 | |
| Succinic Acid SCHEMBL28156291 | 0.81 | LMNA (0.82) | LMNAEGLN1ALKBH5SUCNR1GABRR1 | |
| Succinic Acid SCHEMBL28729193 | 0.81 | LMNA (0.82) | LMNAEGLN1ALKBH5SUCNR1GABRR1 | |
| Succinic Acid SCHEMBL1655131 | 0.81 | LMNA (0.82) | LMNAEGLN1ALKBH5SUCNR1GABRR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9206520-B2 | Inhibiting background plating | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2015-12-08 | — | — | US | disclosed |
| EP-2157209-B1 | Inhibiting Background Plating | ROHM & HAAS ELECT MAT (US) | 2014-10-22 | — | — | EP | disclosed |
| EP-2103716-B1 | Method for Inhibiting Background Plating | ROHM & HAAS ELECT MAT (US) | 2013-05-01 | — | — | EP | disclosed |
| US-7939438-B2 | Method of inhibiting background plating | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-05-10 | — | — | US | disclosed |
| EP-2157209-A2 | Inhibiting Background Plating | Rohm and Haas Electronic Materials LLC (US) | 2010-02-24 | — | — | EP | disclosed |
| US-20100029077-A1 | Inhibiting background plating | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-02-04 | — | — | US | disclosed |
| US-20090258491-A1 | Method of inhibiting background plating | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-10-15 | — | — | US | disclosed |
| EP-2103716-A1 | Method for Inhibiting Background Plating | Rohm and Haas Electronic Materials LLC (US) | 2009-09-23 | — | — | EP | disclosed |
| US-20080035489-A1 | Plating process | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-02-14 | — | — | US | disclosed |
| EP-1865563-A2 | Light assisted electro plating process | Rohm and Haas Electronic Materials, L.L.C. (US) | 2007-12-12 | — | — | EP | disclosed |
| US-6620304-B1 | Aqueous solution containing precious metal ions, amino acid and/or organosulfonic acid, vitamins, surfactants and organonitro-containing material; free of hazardous materials | ROHM & HAAS ELECTRONIC MATERIALS LLC | 2003-09-16 | — | — | US | disclosed |