SCHEMBL186074

SCHEMBL186074

CCCc1ccc(S)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LPL P06858 2/20 0.50
LIPG Q9Y5X9 2/20 0.50
CA2 P00918 1/20 0.46
MGLL Q99685 1/20 0.43
PLK1 P53350 1/20 0.43
CNR1 P21554 1/20 0.43
CNR2 P34972 1/20 0.43
THRB P10828 2/20 0.42
L3MBTL1 Q9Y468 1/20 0.41
TAAR1 Q96RJ0 1/20 0.39
POLB P06746 2/20 0.38
CTDSP1 Q9GZU7 2/20 0.38
KDM4E B2RXH2 2/20 0.38
ALDH1A1 P00352 2/20 0.38
NISCH Q9Y2I1 1/20 0.38
HTR1D P28221 1/20 0.38
GAA P10253 1/20 0.38
LMNA P02545 1/20 0.38
ESR1 P03372 1/20 0.38
SHBG P04278 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL142480 0.85 LPL (0.62) LPLLIPGCA2MGLLPLK1
SCHEMBL10534106 0.85 RARB (0.53) CA2KDM4EALDH1A1NISCHLMNA
SCHEMBL185753 0.84 CA2 (0.54) LPLLIPGCA2MGLLPLK1
Benzenethiol SCHEMBL27641066 0.82 TP53 (0.46) CNR2TAAR1ALDH1A1TP53ADRA2A
SCHEMBL1533007 0.82 ESR1 (0.59) LPLLIPGCA2MGLLKDM4E
SCHEMBL331040 0.82 GFER (0.47) CA2L3MBTL1TAAR1KDM4EALDH1A1
SCHEMBL9839848 0.82 LPL (0.59) LPLLIPGCA2MGLLPLK1
SCHEMBL1402652 0.80 ESR1 (0.63) LPLLIPGMGLLKDM4EALDH1A1
SCHEMBL4222894 0.80 ESR1 (0.63) LPLLIPGMGLLKDM4EALDH1A1
SCHEMBL9352085 0.80 ESR1 (0.63) LPLLIPGMGLLKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 321 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114423742-B Benzotriazole-based compound, light absorber and resin composition 三井化学株式会社 2024-05-28 CN claimed
CN-118063723-A Polythiol composition, preparation method and application thereof, and optical material 益丰新材料股份有限公司 2024-05-24 CN claimed
CN-117326997-A Polythiol compound, composition for optical material, and preparation method and application thereof 益丰新材料股份有限公司 2024-01-02 CN claimed
CN-117304082-A Polythiol compound for optical resin lens, optical resin lens and preparation method of optical resin lens 益丰新材料股份有限公司 2023-12-29 CN claimed
CN-117186057-A Polythiol composition and application thereof 益丰新材料股份有限公司 2023-12-08 CN claimed
CN-116768847-A Thiol composition and application thereof in optical material 益丰新材料股份有限公司 2023-09-19 CN claimed
CN-114790269-A Polythiol composition and application thereof 益丰新材料股份有限公司 2022-07-26 CN claimed
EP-2142485-B1 METALLIC SURFACE ENHANCEMENT MACDERMID ENTHONE INC (US) 2019-07-24 EP claimed
US-8741390-B2 Metallic surface enhancement ENTHONE INC. (US) 2014-06-03 US claimed
US-8703243-B2 Anti-tarnish coatings ENTHONE INC. (US) 2014-04-22 US claimed
CN-101925553-B Anti-tarnish coating ENTHONE 2014-01-15 CN claimed
CN-101743210-B Metallic surface enhancement ENTHONE 2013-04-17 CN claimed
US-20120175022-A1 ANTI-TARNISH COATINGS ENTHONE INC. (US) 2012-07-12 US claimed
US-7972655-B2 Anti-tarnish coatings ENTHONE INC. (US) 2011-07-05 US claimed
CN-101925553-A Anti-tarnish coating ENTHONE 2010-12-22 CN claimed
US-20100291303-A1 ANTI-TARNISH COATINGS ENTHONE INC. (US) 2010-11-18 US claimed
EP-2220009-A1 ANTI-TARNISH COATING Enthone, Inc. (US) 2010-08-25 EP claimed
US-20100151263-A1 METALLIC SURFACE ENHANCEMENT ENTHONE INC. (US) 2010-06-17 US claimed
CN-101743210-A Metal surface enhanced ENTHONE 2010-06-16 CN claimed
WO-2009067446-A1 ANTI-TARNISH COATING ENTHONE INC. (US) 2009-05-28 WO claimed