Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Propylene Glycol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 4/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | MGAM | O43451 | 2/20 | 0.31 |
| ▸ | GAA | P10253 | 2/20 | 0.31 |
| ▸ | SI | P14410 | 2/20 | 0.31 |
| ▸ | MGAM2 | Q2M2H8 | 2/20 | 0.31 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylene Glycol SCHEMBL140963 | 1.00 | ALDH1A1 (0.43) | ALDH1A1TDP1TSHRHSD17B10LMNA | |
| Propylene Glycol SCHEMBL5153420 | 0.89 | ALDH1A1 (0.50) | ALDH1A1TDP1TSHRHSD17B10LMNA | |
| Propylene Glycol SCHEMBL24226 | 0.89 | ALDH1A1 (0.56) | ALDH1A1TDP1TSHRHSD17B10LMNA | |
| Propylene Glycol SCHEMBL27714310 | 0.87 | TDP1 (0.43) | ALDH1A1TDP1TSHRHSD17B10MEN1 | |
| Propylene Glycol SCHEMBL28313165 | 0.87 | TDP1 (0.43) | ALDH1A1TDP1TSHRHSD17B10LMNA | |
| Propylene Glycol SCHEMBL28710964 | 0.86 | TDP1 (0.48) | ALDH1A1TDP1TSHRHSD17B10LMNA | |
| Propylene Glycol SCHEMBL151562 | 0.86 | TDP1 (0.48) | ALDH1A1TDP1TSHRHSD17B10LMNA | |
| Propylene Glycol SCHEMBL14685915 | 0.86 | ALDH1A1 (0.53) | ALDH1A1TDP1TSHRHSD17B10LMNA | |
| 1,3-Butanediol SCHEMBL4324455 | 0.86 | ALDH1A1 (0.39) | ALDH1A1TSHRHSD17B10LMNA | |
| Propylene Glycol SCHEMBL3820290 | 0.86 | TDP1 (0.39) | ALDH1A1TDP1TSHRHSD17B10LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2202 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260098224-A1 | PARAFFIN SUPPRESSANT COMPOSITIONS AND METHODS | CHAMPIONX LLC (US) | 2026-04-09 | — | — | US | claimed |
| CN-118955829-A | Ethynyl-derived complexes, compositions comprising the same, methods of making coatings therefrom, and methods of making devices comprising the coatings | 默克专利有限公司 | 2024-11-15 | — | — | CN | claimed |
| CN-114845746-B | UV curable coatings for medical devices | 生物涂层有限公司 | 2024-04-16 | — | — | CN | claimed |
| US-11914296-B2 | Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating | MERCK PATENT GMBH (DE) | 2024-02-27 | — | — | US | claimed |
| EP-3558917-B1 | NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME | MERCK PATENT GMBH (DE) | 2024-01-24 | — | — | EP | claimed |
| CN-117135973-A | display panel | 武汉华星光电半导体显示技术有限公司 | 2023-11-28 | — | — | CN | claimed |
| CN-114023796-B | display panel | 武汉华星光电半导体显示技术有限公司 | 2023-09-12 | — | — | CN | claimed |
| EP-4223416-A1 | ELECTRODE CATALYST INK, ELECTRODE CATALYST, WATER ELECTROLYSIS CELL, AND WATER ELECTROLYSIS DEVICE | Panasonic Intellectual Property Management Co., Ltd. (JP) | 2023-08-09 | — | — | EP | claimed |
| US-20230227989-A1 | ELECTRODE CATALYST INK, ELECTRODE CATALYST, WATER ELECTROLYSIS CELL, AND WATER ELECTROLYZER | PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) | 2023-07-20 | — | — | US | claimed |
| CN-116375928-A | Photosensitive resin composition and application thereof | 艾森半导体材料(南通)有限公司 | 2023-07-04 | — | — | CN | claimed |
| US-6737215-B2 | Photoresist composition for deep ultraviolet lithography | CLARIANT FINANCE (BVI) LTD (VG) | 2004-05-18 | — | — | US | claimed |
| US-20040048192-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-03-11 | — | — | US | claimed |
| EP-1388027-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD. (CH) | 2004-02-11 | — | — | EP | claimed |
| US-6682876-B2 | Can selectively strip a photoresist coated on a backside and at an edge portion of a substrate | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-01-27 | — | — | US | claimed |
| US-20030157441-A1 | Thinner composition and method of stripping a photoresist using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-08-21 | — | — | US | claimed |
| CN-1404136-A | Method for increasing coating capability of low dielectric layer | LIANHUA ELECTRONICS CO LTD (CN) | 2003-03-19 | — | — | CN | claimed |
| US-20020187419-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-12 | — | — | US | claimed |
| WO-2002093263-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | claimed |
| CN-1222825-A | Integrated manufacturing packaging process | IBM (US) | 1999-07-14 | — | — | CN | claimed |
| US-4692398-A | Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate | AMERICAN HOECHST CORPORATION (US) | 1987-09-08 | — | — | US | claimed |