SCHEMBL18628809

SCHEMBL18628809

CCCCc1c(N)cccc1S(=O)(=O)O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 1/20 0.49
CA2 P00918 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
SKP2 Q13309 1/20 0.37
AURKA O14965 1/20 0.36
AURKB Q96GD4 1/20 0.36
GAA P10253 1/20 0.36
MYC P01106 1/20 0.36
ALDH1A1 P00352 3/20 0.36
HSD17B10 Q99714 2/20 0.36
CA12 O43570 3/20 0.35
CA9 Q16790 3/20 0.35
CYP1A2 P05177 3/20 0.35
CYP2C9 P11712 2/20 0.35
CA1 P00915 1/20 0.35
CA4 P22748 1/20 0.35
CA6 P23280 1/20 0.35
CA5A P35218 1/20 0.35
CA7 P43166 1/20 0.35
CA14 Q9ULX7 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1115550 0.94 TTR (0.46) TTRCA2ALDH1A1HSD17B10CA12
SCHEMBL16713744 0.94 TTR (0.46) TTRCA2ALDH1A1HSD17B10CA12
SCHEMBL18628807 0.90 TTR (0.51) TTRCA2AURKAAURKBGAA
SCHEMBL2724413 0.85 CA2 (0.48) TTRCA2SMN1; SMN2SKP2GAA
SCHEMBL6737495 0.83 MYC (0.38) TTRCA2SMN1; SMN2MYCALDH1A1
SCHEMBL2906795 0.83 TTR (0.55) TTRCA2AURKAAURKBGAA
SCHEMBL441885 0.82 BID (0.39) TTRMYCCA12CA9CYP2C9
SCHEMBL27280509 0.82 SLC37A4 (0.41) CA2SMN1; SMN2AURKAAURKBALDH1A1
SCHEMBL27438387 0.81 RECQL (0.47) TTRCA2SMN1; SMN2MYCALDH1A1
Ammonia Solution, Strong SCHEMBL7031258 0.81 BID (0.38) TTRMYCCA12CA9CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3144351-B1 CONDUCTIVE COMPOSITION, ANTISTATIC FILM, LAMINATE AND PRODUCTION THEREFOR, AND PRODUCTION METHOD FOR PHOTOMASK MITSUBISHI CHEM CORP (JP) 2021-03-31 EP disclosed
US-20170261854-A1 CONDUCTIVE COMPOSITION, ANTISTATIC FILM, LAMINATE AND PRODUCTION THEREFOR, AND PRODUCTION METHOD FOR PHOTOMASK MITSUBISHI CHEMICAL CORPORATION (JP) 2017-09-14 US disclosed
EP-3144351-A1 CONDUCTIVE COMPOSITION, ANTISTATIC FILM, LAMINATE AND PRODUCTION THEREFOR, AND PRODUCTION METHOD FOR PHOTOMASK Mitsubishi Rayon Co., Ltd. (JP) 2017-03-22 EP disclosed