SCHEMBL18644308

SCHEMBL18644308

Cc1cccc2c3c(ccc12)C(c1ccc(-c2ccccc2)cc1)c1ccc2c(O)cccc2c1O3

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MYB P10242 5/20 0.36
HSD17B1 P14061 2/20 0.34
HSD17B2 P37059 2/20 0.34
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
ESR1 P03372 2/20 0.33
ESR2 Q92731 2/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2A6 P11509 1/20 0.33
ACHE P22303 3/20 0.33
GAA P10253 1/20 0.33
CDK4 P11802 1/20 0.33
CCND1 P24385 1/20 0.33
TYMS P04818 1/20 0.32
MAOA P21397 1/20 0.32
MAOB P27338 1/20 0.32
EPHX1 P07099 2/20 0.32
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
HTT P42858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18644309 0.84 MEN1 (0.36) HSD17B1HSD17B2MEN1KMT2AESR1
SCHEMBL15998801 0.76 NPSR1 (0.39) HSD17B1HSD17B2MEN1KMT2AESR1
SCHEMBL23900988 0.75 CYP1A2 (0.40) MYBCYP1A2ACHE
SCHEMBL15688238 0.74 GAA (0.41) MEN1KMT2AESR1ESR2CYP1A2
SCHEMBL21755772 0.73 MYB (0.33) MYBESR1ESR2CYP1A2LMNA
SCHEMBL15998784 0.72 ESR2 (0.45) MYBHSD17B1HSD17B2MEN1KMT2A
SCHEMBL1101882 0.70 CYP1A2 (0.68) HSD17B1HSD17B2MEN1KMT2AESR1
SCHEMBL18644307 0.68 NQO1 (0.41) HSD17B1HSD17B2MEN1KMT2AESR1
SCHEMBL8772386 0.68 GAA (0.36) MEN1KMT2AESR1ESR2CYP1A2
SCHEMBL21971755 0.68 KDM1A (0.40) MEN1KMT2ACYP1A2MAOBEPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9598392-B2 Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-03-21 US disclosed