SCHEMBL1864607

SCHEMBL1864607

C=CC(=O)N(CC)C(C)C#N

nearest known ligand 0.38

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ZDHHC20 Q5W0Z9 2/20 0.38
ZDHHC2 Q9UIJ5 1/20 0.38
DPP4 P27487 1/20 0.32
ALDH1A1 P00352 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL460923 0.78 TSHR (0.42) ZDHHC20ZDHHC2ALDH1A1TSHR
SCHEMBL2478563 0.76 ZDHHC20 (0.39) ZDHHC20ZDHHC2DPP4ALDH1A1TSHR
SCHEMBL1881902 0.76 TSHR (0.36) ZDHHC20ZDHHC2ALDH1A1TSHR
SCHEMBL5428814 0.75 TSHR (0.34) ZDHHC20ZDHHC2ALDH1A1TSHR
SCHEMBL7051119 0.75 DPP4 (0.46) ZDHHC20ZDHHC2DPP4TSHR
SCHEMBL27965429 0.75 TSHR (0.39) ZDHHC20ZDHHC2ALDH1A1TSHR
SCHEMBL2819500 0.74 CHRM2 (0.32) DPP4
SCHEMBL28775233 0.74 ALDH1A1 (0.37) ZDHHC20ZDHHC2ALDH1A1TSHR
SCHEMBL10596060 0.73 TSHR (0.38) ZDHHC20ZDHHC2ALDH1A1TSHR
SCHEMBL17665959 0.73 TSHR (0.38) ZDHHC20ZDHHC2ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8293846-B2 Composition for forming layer to be plated, method of producing metal pattern material, metal pattern material FUJIFILM CORPORATION (JP) 2012-10-23 US disclosed
US-20110104454-A1 COMPOSITION FOR FORMING LAYER TO BE PLATED, METHOD OF PRODUCING METAL PATTERN MATERIAL, AND METAL PATTERN MATERIAL FUJIFILM CORPORATION (JP) 2011-05-05 US disclosed
US-20100080964-A1 COMPOSITION FOR FORMING LAYER TO BE PLATED, METHOD OF PRODUCING METAL PATTERN MATERIAL, METAL PATTERN MATERIAL FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed