⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27834 | 0.79 | — | — | |
| SCHEMBL18694667 | 0.79 | EPHX1 (0.35) | — | |
| SCHEMBL4545266 | 0.78 | KEAP1 (0.48) | — | |
| SCHEMBL13161499 | 0.78 | HSD17B10 (0.41) | — | |
| SCHEMBL17285643 | 0.77 | — | — | |
| SCHEMBL1120298 | 0.77 | — | — | |
| SCHEMBL12443985 | 0.77 | ALDH1A1 (0.46) | — | |
| SCHEMBL1714183 | 0.77 | — | — | |
| SCHEMBL18694838 | 0.76 | EPHX1 (0.33) | — | |
| SCHEMBL4685173 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1877232-B1 | METHOD FOR TREATING WOOD SURFACES | BASF SE (DE) | 2014-05-14 | — | — | EP | claimed |
| US-7976668-B2 | process for the production of wood-base materials which have at least one thin veneer layer adhesively bonded over the surface to a substrate or to further veneer layers, which process comprises the following steps:i. impregnation of a veneer with an aqueous curable and gluing | BASF AKTIENGESELLSCHAFT (DE) | 2011-07-12 | — | — | US | claimed |
| US-7939177-B2 | Wood; a formaldehyde condensate, in crosslinked form and based on the total weight of the lignocellulose material;improved mechanical strength, weathering resistance, reduced crack formation | BASF AKTIENGESELLSCHAFT (DE) | 2011-05-10 | — | — | US | claimed |
| US-7846508-B2 | Method for treating wood surfaces | BASF AKTIENGESELLSCHAFT (DE) | 2010-12-07 | — | — | US | claimed |
| EP-1858678-B1 | METHOD FOR PRODUCING WOOD-BASE MATERIALS | BASF SE (DE) | 2010-10-06 | — | — | EP | claimed |
| EP-1934027-B1 | PRODUCTION OF MODIFIED LIGNOCELLULOSIC MATERIALS | BASF SE (DE) | 2009-09-23 | — | — | EP | claimed |
| US-20080226932-A1 | Use of Modified Wood Materials for Producing Articles | BASF SE (DE) | 2008-09-18 | — | — | US | claimed |
| US-20080223360-A1 | Production of Modified Lignocellulosic Materials | BASF SE (DE) | 2008-09-18 | — | — | US | claimed |
| US-20080220277-A1 | Lignocelluosic Material Which is Low in Formaldehyde and Method for the Production Thereof | BASF SE (DE) | 2008-09-11 | — | — | US | claimed |
| US-20080193785-A1 | Wood-base material is impregnated beforehand with a curable aqueous composition which comprises at least one crosslinkable compound such as 1,3-bis(hydroxymethyl)-4,5-dihydroxyimidazolidin-2-one | BASF AKTIENGESELLSCHAFT (DE) | 2008-08-14 | — | — | US | claimed |
| US-20080187669-A1 | Method For Waterproofing Lignocellulosic Materials | BASF AKTIENGESELLSCHAFT (DE) | 2008-08-07 | — | — | US | claimed |
| US-20080160288-A1 | Method for Impregnating Lignocellulosic Materials with Effect Agents | BASF AKTIENGESELLSCHAFT (DE) | 2008-07-03 | — | — | US | claimed |
| US-20080156435-A1 | Method for Producing Wood-Base Materials | BASF AKTIENGESELLSCHAFT (DE) | 2008-07-03 | — | — | US | claimed |
| US-20230398224-A1 | TARGETED PLASMA PROTEIN DEGRADATION | NOVARTIS AG (CH) | 2023-12-14 | — | — | US | disclosed |
| US-10545405-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2020-01-28 | — | — | US | disclosed |
| US-20170351176-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| EP-0620003-B1 | VASOPRESSIN ANTAGONIST AND OXYTOCIN ANTAGONIST | OTSUKA PHARMA CO LTD (JP) | 2008-01-16 | — | — | EP | disclosed |
| US-5753644-A | Vasopressin antagonist and oxytocin antagonist | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1998-05-19 | — | — | US | disclosed |
| US-5622947-A | VASODILATORS, HYPOTENSIVE AGENTS, DIURETICS, PLATELET AGGLUTINATION INHIBITORS; ALSO USED TO PREVENT PREMATURE BIRTH, TREAT DYSMENORRHEA | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1997-04-22 | — | — | US | disclosed |
| EP-0620003-A1 | VASOPRESSIN ANTAGONIST AND OXYTOCIN ANTAGONIST | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1994-10-19 | — | — | EP | disclosed |