Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LCK | P06239 | 3/20 | 0.36 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.36 |
| ▸ | ERN1 | O75460 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 4/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 3/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | EGFR | P00533 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20274260 | 0.89 | PTPN22 (0.37) | LCKPTPN22ERN1MAPTKMT2A | |
| SCHEMBL18671921 | 0.87 | KDM4E (0.39) | ERN1MAPTKMT2AMEN1GAA | |
| SCHEMBL8738223 | 0.86 | LCK (0.37) | LCKPTPN22ERN1MAPTKMT2A | |
| SCHEMBL20691750 | 0.83 | KDM4E (0.40) | PTPN22MAPTKMT2AMEN1GAA | |
| SCHEMBL18671982 | 0.83 | ALDH1A1 (0.38) | MAPTKMT2AMEN1GAAKDM4E | |
| SCHEMBL19173251 | 0.82 | GAA (0.42) | MAPTKMT2AMEN1GAAKDM4E | |
| SCHEMBL19996756 | 0.81 | — | — | |
| SCHEMBL18671978 | 0.80 | LCK (0.36) | LCKPTPN22ERN1MAPTKMT2A | |
| SCHEMBL12999449 | 0.78 | LCK (0.34) | LCKPTPN22ERN1MAPTKMT2A | |
| SCHEMBL18671928 | 0.77 | NTRK1 (0.36) | MAPTKMT2AMEN1GAAKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9904172-B2 | Shrink material and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-9632417-B2 | Shrink material and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9604921-B2 | Sulfonium salt, resist composition and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |