SCHEMBL18680263

SCHEMBL18680263

CC(=O)Cc1ccc2c(c1)C=CC2

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.37
GRIA2 P42262 1/20 0.33
ALDH1A1 P00352 2/20 0.33
HPGD P15428 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
LMNA P02545 3/20 0.31
MAPK1 P28482 1/20 0.30
KDM4E B2RXH2 1/20 0.30
RGS12 O14924 1/20 0.30
GAA P10253 1/20 0.30
MAPT P10636 1/20 0.30
TSHR P16473 1/20 0.30
NFKB1 P19838 1/20 0.30
APEX1 P27695 1/20 0.30
THPO P40225 1/20 0.30
BLM P54132 1/20 0.30
GNAI1 P63096 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23365342 0.87 POLB (0.37) POLBGRIA2ALDH1A1HPGDSMN1; SMN2
SCHEMBL1650312 0.85 KDM4E (0.46) POLBALDH1A1HPGDLMNAKDM4E
SCHEMBL6904988 0.77 TRPA1 (0.38) ALDH1A1SMN1; SMN2CYP1A2LMNAMAPK1
SCHEMBL7182926 0.76 CA1 (0.32)
SCHEMBL7193247 0.76 CA2 (0.33) POLBKDM4EGAAMAPT
SCHEMBL6914459 0.74 CNR1 (0.40)
SCHEMBL21858014 0.74 KDM4E (0.42) ALDH1A1KDM4EGAAMAPTTSHR
SCHEMBL23100767 0.74 RAB9A (0.52) ALDH1A1HPGDLMNAKDM4EMAPT
SCHEMBL28122675 0.74
SCHEMBL21694437 0.73 HRH3 (0.34) GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10295906-B2 Conductive polymer composition, coated article, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-05-21 US disclosed
US-20170090286-A1 CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-30 US disclosed