SCHEMBL18698659

SCHEMBL18698659

CC(C)(OC=O)C1CC2CCC1C2

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.33
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13293834 1.00 TDP1 (0.33) TDP1ATM
SCHEMBL5917716 0.83
SCHEMBL5196580 0.81
SCHEMBL19574083 0.80 EPHX2 (0.32)
SCHEMBL10281324 0.77 EPHX2 (0.33)
SCHEMBL12066321 0.76 SLC6A3 (0.32)
SCHEMBL3674828 0.73 SLC6A3 (0.34) ATM
SCHEMBL13641583 0.72 CYP19A1 (0.31)
SCHEMBL5917718 0.72 EPHX2 (0.36)
SCHEMBL5195615 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9612535-B2 Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2017-04-04 US disclosed