Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 15/20 | 0.45 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | NSD2 | O96028 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | PTGS1 | P23219 | 3/20 | 0.37 |
| ▸ | DRD1 | P21728 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14712815 | 0.83 | PTGS2 (0.64) | PTGS2PTGS1 | |
| SCHEMBL16638368 | 0.80 | CA2 (0.42) | CA12CA1CA2CA9MAPT | |
| SCHEMBL19365898 | 0.80 | MAPT (0.50) | MAPTMEN1KMT2AHKDC1NPSR1 | |
| SCHEMBL12361695 | 0.79 | MAPT (0.47) | MAPTMEN1KMT2AHKDC1NPSR1 | |
| SCHEMBL15606260 | 0.77 | NR1H2 (0.45) | MAPTMEN1KMT2AHKDC1NPSR1 | |
| SCHEMBL3282090 | 0.75 | TSHR (0.43) | CA12CA1CA2CA9 | |
| SCHEMBL25430599 | 0.75 | PTGS2 (0.50) | PTGS2PTGS1DRD1 | |
| SCHEMBL28301092 | 0.74 | PTGS2 (0.71) | PTGS2CA12CA1CA2CA9 | |
| SCHEMBL15834156 | 0.74 | TP53 (0.38) | PTGS2MAPTMEN1KMT2AHKDC1 | |
| SCHEMBL17301737 | 0.74 | HTR1A (0.46) | MAPTMEN1KMT2AHKDC1NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9612535-B2 | Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-04 | — | — | US | disclosed |