Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.45 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | NFE2L2 | Q16236 | 5/20 | 0.33 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.33 |
| ▸ | FBP1 | P09467 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30414461 | 1.00 | ALDH1A1 (0.45) | ALDH1A1KCNH2KMT2AMEN1CYP3A4 | |
| Methane SCHEMBL1904173 | 0.98 | ALDH1A1 (0.43) | ALDH1A1KCNH2KMT2AMEN1CYP3A4 | |
| SCHEMBL5550084 | 0.89 | MAPT (0.39) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 | |
| SCHEMBL28299330 | 0.87 | ALDH1A1 (0.42) | ALDH1A1KCNH2MAPK1HSD17B10LMNA | |
| SCHEMBL27834941 | 0.85 | ALDH1A1 (0.35) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 | |
| SCHEMBL11986233 | 0.83 | LMNA (0.34) | ALDH1A1KCNH2KMT2ANFE2L2TRPA1 | |
| SCHEMBL5356410 | 0.82 | ALDH1A1 (0.36) | ALDH1A1KCNH2KMT2AMEN1CYP3A4 | |
| SCHEMBL28560205 | 0.81 | MAPK1 (0.45) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 | |
| SCHEMBL3783784 | 0.81 | ALDH1A1 (0.35) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 | |
| SCHEMBL6413639 | 0.81 | KCNH2 (0.35) | ALDH1A1KCNH2KMT2ANFE2L2TRPA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3397 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260121056-A1 | CROSSLINKING BINDER FOR ANODE OF SECONDARY BATTERY, ANODE MIXTURE, ANODE AND SECONDARY BATTERY | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2026-04-30 | — | — | US | claimed |
| EP-3936559-B1 | PAINTABLE AND PAINTED MATERIALS WITH STRUCTURED SURFACES | FRITZ EGGER GMBH & CO OG (AT) | 2025-10-22 | — | — | EP | claimed |
| US-20250293030-A1 | SOLUBILITY SWITCH TOPOGRAPHIC FILL MATERIALS AND METHODS | BREWER SCIENCE, INC. | 2025-09-18 | — | — | US | claimed |
| US-12338374-B2 | Pressure sensitive adhesive composition and protective film employing the same | TSRC CORPORATION (TW) | 2025-06-24 | — | — | US | claimed |
| CN-119912631-A | Self-foaming polymethacrylimide foam material and preparation method thereof | 中国科学院过程工程研究所 | 2025-05-02 | — | — | CN | claimed |
| CN-119912779-A | Heterogeneous wave-absorbing polymethacrylimide foam material and preparation method thereof | 中国科学院过程工程研究所 | 2025-05-02 | — | — | CN | claimed |
| CN-119912632-A | Homogeneous polymethacrylimide composite wave-absorbing material and preparation method and application thereof | 中国科学院过程工程研究所 | 2025-05-02 | — | — | CN | claimed |
| US-20250084190-A1 | COMPOSITIONS INCLUDING FUNCTIONALIZED SILYLATED POLYMERS, CURED COMPOSITIONS AND METHODS | BRIDGESTONE CORPORATION (JP) | 2025-03-13 | — | — | US | claimed |
| US-20250084108-A1 | SILYLATING GRAFTING AGENTS, POLYMERS GRAFTED THEREWITH AND METHODS OF SYNTHESIS | BRIDGESTONE CORPORATION (JP) | 2025-03-13 | — | — | US | claimed |
| CN-119591759-A | KrF photoresist film-forming resin and preparation method and application thereof | 北京光舟科技有限公司 | 2025-03-11 | — | — | CN | claimed |
| US-5914219-A | Radiation-sensitive mixture and the production of relief structures having improved contrast | BASF AKTIENGESELLSCHAFT (DE) | 1999-06-22 | — | — | US | claimed |
| EP-0540965-B1 | Positive light sensitive composition and process for the formation of relief pattern | BASF AG (DE) | 1999-06-09 | — | — | EP | claimed |
| EP-0843220-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-20 | — | — | EP | claimed |
| EP-0616258-B1 | Radiation sensitive composition and process for forming relief structures with improved contrast | BASF AG (DE) | 1997-05-21 | — | — | EP | claimed |
| US-5563022-A | MIXTURE OF WATER INSOLUBLE ORGANIC BINDER HAVING ACID-LABILE ETHER, ESTER OR CARBONATE GROUPS OR BEING SOLUBLE IN ALKALINE SOLUTIONS, ORGANIC COMPOUND WHOSE SOLUBILITY IS INCREASED BY ACID, ARYLSULFONIC ESTER | BASF AKTIENGESELLSCHAFT (DE) | 1996-10-08 | — | — | US | claimed |
| EP-0605856-B1 | Process for the manufacture of p-hydroxystyrene polymers and use thereof | BASF AG (DE) | 1996-08-28 | — | — | EP | claimed |
| EP-0284868-B1 | Photoresist compositions | MICROSI INC (US) | 1995-05-03 | — | — | EP | claimed |
| WO-1994011788-A1 | METHOD OF PRODUCING MICROSTRUCTURES | TECHNISCHE UNIVERSITEIT DELFT (NL) | 1994-05-26 | — | — | WO | claimed |
| US-5314978-A | Copolymer of sulfur dioxide and nuclear-substituted trialkylgermylstyrene | KUMHO PETROCHEMICAL COMPANY, LIMITED (KR) | 1994-05-24 | — | — | US | claimed |
| EP-0284868-A2 | Photoresist compositions | MicroSi, Inc. (a Delaware corporation) (US) | 1988-10-05 | — | — | EP | claimed |