SCHEMBL18747697

SCHEMBL18747697

CCCN(CCS(=O)(=O)O)C1CCCCC1

nearest known ligand 0.43

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ADH1A P07327 3/20 0.43
DRD3 P35462 7/20 0.41
DRD2 P14416 5/20 0.41
DRD4 P21917 4/20 0.41
ADH1C P00326 2/20 0.41
FYN P06241 3/20 0.34
MEN1 O00255 1/20 0.34
ALDH1A1 P00352 1/20 0.34
POLB P06746 1/20 0.34
CYP2C19 P33261 1/20 0.34
KMT2A Q03164 1/20 0.34
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA9 Q16790 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18747695 0.88 ADH1A (0.39) ADH1ADRD3DRD2DRD4ADH1C
SCHEMBL11458712 0.87 DRD2 (0.41) ADH1ADRD3DRD2DRD4ADH1C
Ammonia Solution, Strong SCHEMBL28049353 0.86 DRD2 (0.40) ADH1ADRD3DRD2DRD4ADH1C
SCHEMBL18251488 0.83 SLC6A4 (0.41) DRD3DRD2DRD4FYN
SCHEMBL516269 0.81 ADH1A (0.54) ADH1ADRD3DRD2DRD4ADH1C
SCHEMBL11073680 0.81 ADH1A (0.54) ADH1ADRD3DRD2DRD4ADH1C
SCHEMBL22541111 0.81 ADH1A (0.54) ADH1ADRD3DRD2DRD4ADH1C
SCHEMBL516016 0.79 ADH1A (0.52) ADH1ADRD3DRD2DRD4ADH1C
SCHEMBL15865807 0.77 DRD3 (0.48) ADH1ADRD3DRD2DRD4ADH1C
SCHEMBL13851756 0.77 HRH4 (0.37) ADH1AADH1CMEN1ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10509314-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-12-17 US disclosed
US-20170108774-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-20 US disclosed
US-20170108774-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10509314-B2 Resist composition and patterning process SRMS, SLC11A2, PCNA ADH1A 3801/4885DRD3 2270/4885DRD2 1071/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.