SCHEMBL18768277

SCHEMBL18768277

CC(=O)OCC1CC2CC1C(O)(C(F)(F)F)C2(F)F

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ NLRP3 Q96P20 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18758017 0.87 ALDH1A1 (0.41) —
SCHEMBL18897983 0.81 — —
SCHEMBL18456062 0.77 ALDH1A1 (0.34) —
SCHEMBL23974117 0.76 — —
SCHEMBL20215431 0.72 — —
SCHEMBL20215430 0.72 — —
SCHEMBL19335284 0.70 — —
SCHEMBL18758021 0.69 ALDH1A1 (0.42) —
SCHEMBL121141 0.67 CYP19A1 (0.35) —
SCHEMBL18400945 0.67 ALDH1A1 (0.42) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180134860-A1 STRETCHABLE FILM, METHOD FOR FORMING THE SAME, STRETCHABLE WIRING FILM, AND METHOD FOR MANUFACTURING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-17 — — US disclosed
US-20170108775-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-20 — — US disclosed
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