SCHEMBL20215430

SCHEMBL20215430

CCC(I)C(=O)OCC1CC2CC1C(F)(F)C2(O)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18897904 0.91 — —
SCHEMBL20691876 0.83 — —
SCHEMBL18897963 0.75 — —
SCHEMBL20691777 0.75 — —
SCHEMBL18768277 0.72 NLRP3 (0.30) —
SCHEMBL20820982 0.71 — —
SCHEMBL18897983 0.71 — —
SCHEMBL21281784 0.70 — —
SCHEMBL19808266 0.69 — —
SCHEMBL21281785 0.67 TSHR (0.32) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9989847-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 — — US disclosed
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