SCHEMBL18804151

SCHEMBL18804151

CC(C)SCCOCN1C(=O)N(COCCSC(C)C)C2C1N(COCCSC(C)C)C(=O)N2COCCSC(C)C

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18804158 0.80 L3MBTL1 (0.34) L3MBTL1
SCHEMBL18804154 0.77 L3MBTL1 (0.36) L3MBTL1
SCHEMBL18804140 0.77 L3MBTL1 (0.34) L3MBTL1
SCHEMBL7620836 0.72 L3MBTL1 (0.36) L3MBTL1
SCHEMBL18804139 0.72 L3MBTL1 (0.36) L3MBTL1
SCHEMBL18804142 0.72 L3MBTL1 (0.41) L3MBTL1
SCHEMBL124787 0.71 GAA (0.42) L3MBTL1
SCHEMBL13884052 0.69 L3MBTL1 (0.52) L3MBTL1
SCHEMBL18804135 0.69 GAA (0.41) L3MBTL1
SCHEMBL18804147 0.68 L3MBTL1 (0.37) L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822248-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-11-21 US disclosed
US-11822248-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-11-21 US disclosed
US-20170123319-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-05-04 US disclosed
US-20170123319-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-05-04 US disclosed