SCHEMBL18804142

SCHEMBL18804142

CCOCCOCN1C(=O)N(COCCOCC)C2C1N(COCCOCC)C(=O)N2COCCOCC

nearest known ligand 0.41

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.41
ALDH1A1 P00352 2/20 0.34
TSHR P16473 1/20 0.34
GAA P10253 2/20 0.33
TP53 P04637 1/20 0.31
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL196638 0.89 L3MBTL1 (0.45) L3MBTL1GAATP53
SCHEMBL18804148 0.86 L3MBTL1 (0.39) L3MBTL1GAATP53
SCHEMBL196871 0.85 L3MBTL1 (0.42) L3MBTL1GAATP53
SCHEMBL11308698 0.83 L3MBTL1 (0.41) L3MBTL1TSHRGAATP53
SCHEMBL18804139 0.83 L3MBTL1 (0.36) L3MBTL1ALDH1A1
SCHEMBL16451550 0.83 L3MBTL1 (0.55) L3MBTL1GAATP53
SCHEMBL124787 0.82 GAA (0.42) L3MBTL1ALDH1A1TSHRGAATP53
SCHEMBL12024038 0.82 L3MBTL1 (0.39) L3MBTL1GAATP53
SCHEMBL18804155 0.82 L3MBTL1 (0.35) L3MBTL1
SCHEMBL18804135 0.80 GAA (0.41) L3MBTL1ALDH1A1TSHRGAATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822248-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-11-21 US disclosed
US-11822248-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-11-21 US disclosed
US-20170123319-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-05-04 US disclosed
US-20170123319-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-05-04 US disclosed