Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 11/20 | 0.47 |
| ▸ | MTNR1B | P49286 | 11/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2740796 | 0.88 | MTNR1A (0.46) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL10267902 | 0.85 | MTNR1A (0.52) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL21136912 | 0.83 | MTNR1A (0.46) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL19645628 | 0.83 | LMNA (0.41) | LMNAMAPTNPSR1 | |
| SCHEMBL14750838 | 0.83 | MTNR1A (0.42) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL16943708 | 0.82 | MTNR1A (0.50) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL21117245 | 0.82 | MTNR1A (0.46) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL19335458 | 0.80 | MTNR1A (0.37) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL20306559 | 0.80 | MTNR1A (0.48) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL2776949 | 0.80 | MTNR1A (0.48) | MTNR1AMTNR1BKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10007178-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-9869931-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9645498-B2 | Developer and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-09 | — | — | US | disclosed |