Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 12/20 | 0.48 |
| ▸ | MTNR1B | P49286 | 12/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | OPRL1 | P41146 | 2/20 | 0.34 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20306559 | 1.00 | MTNR1A (0.48) | MTNR1AMTNR1BKDM4EOPRL1OPRM1 | |
| SCHEMBL16943708 | 0.89 | MTNR1A (0.50) | MTNR1AMTNR1BKDM4EOPRL1OPRM1 | |
| SCHEMBL9610299 | 0.86 | MTNR1A (0.44) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL10267902 | 0.85 | MTNR1A (0.52) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL16866687 | 0.84 | POLB (0.38) | MTNR1AMTNR1B | |
| SCHEMBL73552 | 0.83 | MTNR1A (0.46) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL13329095 | 0.81 | MTNR1A (0.45) | MTNR1AMTNR1B | |
| SCHEMBL19771569 | 0.81 | MTNR1A (0.35) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL20306558 | 0.80 | KDM4E (0.35) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL18826331 | 0.80 | MTNR1A (0.47) | MTNR1AMTNR1BKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 163 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4267708-B1 | THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS | INFINEUM INT LTD (GB) | 2025-07-02 | — | — | EP | disclosed |
| US-12281203-B2 | Thermally responsive brush polymers having a copolymer backbone and copolymer arms | INFINEUM INTERNATIONAL LIMITED (GB) | 2025-04-22 | — | — | US | disclosed |
| US-20240309155-A1 | Thermally Responsive Brush Polymers Having a Copolymer Backbone and Copolymer Arms | INFINEUM INTERNATIONAL LIMITED (GB) | 2024-09-19 | — | — | US | disclosed |
| EP-4267708-A1 | THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS | Infineum International Limited (GB) | 2023-11-01 | — | — | EP | disclosed |
| WO-2022136384-A1 | THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS | INFINEUM INTERNATIONAL LIMITED (GB) | 2022-06-30 | — | — | WO | disclosed |
| US-10007178-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-10007178-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-20180134860-A1 | STRETCHABLE FILM, METHOD FOR FORMING THE SAME, STRETCHABLE WIRING FILM, AND METHOD FOR MANUFACTURING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-17 | — | — | US | disclosed |
| US-20180134860-A1 | STRETCHABLE FILM, METHOD FOR FORMING THE SAME, STRETCHABLE WIRING FILM, AND METHOD FOR MANUFACTURING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-17 | — | — | US | disclosed |
| US-9869931-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| US-20100255418-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100227273-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-09 | — | — | US | disclosed |
| US-20100227273-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-09 | — | — | US | disclosed |
| US-20100227273-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-09 | — | — | US | disclosed |
| US-7687228-B2 | Antireflection film composition and patterning process using the same | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-7687228-B2 | Antireflection film composition and patterning process using the same | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-20080227037-A1 | Resist lower layer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080227037-A1 | Resist lower layer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080220381-A1 | Antireflection film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |
| US-20080220381-A1 | Antireflection film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100255418-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | RER1, NOC2L, RAD51 | MTNR1A 935/4885MTNR1B 1446/4885KDM4E 3848/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.