SCHEMBL18840319

SCHEMBL18840319

COc1ccc(C2(c3ccc(OC)cc3)OC3CCCCC3O2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A4 P31645 5/20 0.43
SLC6A3 Q01959 4/20 0.43
MAOB P27338 2/20 0.43
MAOA P21397 1/20 0.43
SLC6A2 P23975 1/20 0.43
KDM4E B2RXH2 1/20 0.41
CYP3A4 P08684 1/20 0.40
CTSE P14091 1/20 0.40
CYP2C19 P33261 1/20 0.40
BACE1 P56817 1/20 0.40
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
CA7 P43166 1/20 0.39
CA9 Q16790 1/20 0.39
CA14 Q9ULX7 1/20 0.39
GRIN1 Q05586 1/20 0.39
GRIN2A Q12879 1/20 0.39
GRIN2B Q13224 1/20 0.39
CHRNA1 P02708 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18840325 1.00 SLC6A4 (0.43) SLC6A4SLC6A3MAOBMAOASLC6A2
SCHEMBL18840315 0.76 MAOB (0.41) SLC6A4SLC6A3MAOBMAOASLC6A2
SCHEMBL16543025 0.72 CA1 (0.44) SLC6A4SLC6A3MAOBMAOASLC6A2
SCHEMBL18287951 0.72 CA1 (0.44) SLC6A4SLC6A3MAOBMAOASLC6A2
SCHEMBL28736440 0.71 OPRM1 (0.49) MAOBMAOAKDM4EBACE1CA12
SCHEMBL17024451 0.71 CA1 (0.48) SLC6A4SLC6A3MAOBMAOAKDM4E
SCHEMBL18840327 0.69 ALDH1A1 (0.54) BACE1CA1CA2
SCHEMBL1071370 0.69 MAPT (0.53) KDM4ECYP3A4CA12CA1CA2
SCHEMBL3148517 0.67 MAPT (0.51) KDM4ECYP3A4CA12CA1CA2
SCHEMBL18287895 0.67 CHRNA1 (0.46) SLC6A4SLC6A3MAOBMAOABACE1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9989849-B2 Chemically amplified resist material and resist pattern-forming method JSR CORPORATION (JP) 2018-06-05 US disclosed
US-9989849-B2 Chemically amplified resist material and resist pattern-forming method JSR CORPORATION (JP) 2018-06-05 US disclosed
US-20170131634-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-05-11 US disclosed
US-20170131634-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-05-11 US disclosed