Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 12/20 | 0.56 |
| ▸ | MTNR1B | P49286 | 4/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.50 |
| ▸ | HTR2A | P28223 | 2/20 | 0.48 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.47 |
| ▸ | SIRT1 | Q96EB6 | 1/20 | 0.47 |
| ▸ | SIRT3 | Q9NTG7 | 1/20 | 0.47 |
| ▸ | SIRT5 | Q9NXA8 | 1/20 | 0.47 |
| ▸ | HTR2C | P28335 | 1/20 | 0.43 |
| ▸ | HTR2B | P41595 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31656345 | 1.00 | MTNR1A (0.56) | MTNR1AMTNR1BCYP1A2CYP2A6HTR2A | |
| SCHEMBL6446906 | 0.86 | SIRT2 (0.60) | MTNR1AMTNR1BCYP1A2CYP2A6SIRT2 | |
| SCHEMBL1897588 | 0.84 | MTNR1A (0.57) | MTNR1AMTNR1BCYP1A2CYP2A6HTR2A | |
| SCHEMBL1882848 | 0.83 | MTNR1A (0.59) | MTNR1AMTNR1BCYP1A2CYP2A6HTR2A | |
| SCHEMBL10298599 | 0.81 | MTNR1A (0.62) | MTNR1AMTNR1BCYP1A2CYP2A6HTR2A | |
| SCHEMBL17188136 | 0.80 | MTNR1A (0.53) | MTNR1AMTNR1BCYP1A2CYP2A6HTR2A | |
| SCHEMBL6584082 | 0.79 | MTNR1A (0.38) | MTNR1AMTNR1BCYP1A2HTR2ASIRT2 | |
| SCHEMBL21244243 | 0.77 | CYP1A2 (0.57) | CYP1A2CYP2A6 | |
| Acetonitrile SCHEMBL27175951 | 0.76 | MTNR1A (0.53) | MTNR1AMTNR1BCYP1A2CYP2A6HTR2A | |
| SCHEMBL3623450 | 0.76 | NQO1 (0.48) | MTNR1BCYP1A2SIRT2SIRT1SIRT3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9568821-B2 | Patterning process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-02-14 | — | — | US | disclosed |
| US-9568821-B2 | Patterning process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-02-14 | — | — | US | disclosed |
| US-20170003590-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-05 | — | — | US | disclosed |
| US-20170003590-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-05 | — | — | US | disclosed |
| US-20160363866-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-20160363866-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| EP-2151428-A1 | Process for the preparation of agomelatin | Les Laboratoires Servier (FR) | 2010-02-10 | — | — | EP | disclosed |
| EP-1048981-B1 | Methode for negative type image recording | FUJIFILM CORP (JP) | 2009-08-19 | — | — | EP | disclosed |
| WO-2009022064-A2 | NOVEL NAPHTHALENE DERIVATIVES, PROCESS FOR THE PREPARATION THEREOF AND PHARMACEUTICAL COMPOSITIONS CONTAINING SAME | LES LABORATOIRES SERVIER (FR) | 2009-02-19 | — | — | WO | disclosed |
| WO-2009022066-A2 | NOVEL NAPHTHALENE DERIVATIVES, PROCESS FOR THE PREPARATION THEREOF AND PHARMACEUTICAL COMPOSITIONS CONTAINING SAME | LES LABORATOIRES SERVIER (FR) | 2009-02-19 | — | — | WO | disclosed |
| WO-2009022066-A2 | NOVEL NAPHTHALENE DERIVATIVES, PROCESS FOR THE PREPARATION THEREOF AND PHARMACEUTICAL COMPOSITIONS CONTAINING SAME | LES LABORATOIRES SERVIER (FR) | 2009-02-19 | — | — | WO | disclosed |
| WO-2009022063-A2 | NOVEL NAPHTHALENE DERIVATIVES, PROCESS FOR THE PREPARATION THEREOF AND PHARMACEUTICAL COMPOSITIONS CONTAINING SAME | LES LABORATOIRES SERVIER (FR) | 2009-02-19 | — | — | WO | disclosed |
| WO-2009022063-A2 | NOVEL NAPHTHALENE DERIVATIVES, PROCESS FOR THE PREPARATION THEREOF AND PHARMACEUTICAL COMPOSITIONS CONTAINING SAME | LES LABORATOIRES SERVIER (FR) | 2009-02-19 | — | — | WO | disclosed |
| US-7306898-B2 | Planographic printing method and planographic printing plate precursor used therein | FUJIFILM CORPORATION (JP) | 2007-12-11 | — | — | US | disclosed |
| US-7306898-B2 | Planographic printing method and planographic printing plate precursor used therein | FUJIFILM CORPORATION (JP) | 2007-12-11 | — | — | US | disclosed |
| EP-1566267-B1 | Planographic printing method and planographic printing plate precursor used therein | FUJIFILM CORP (JP) | 2007-04-18 | — | — | EP | disclosed |