SCHEMBL6446906

SCHEMBL6446906

C=Cc1cccc2cc(OC)ccc12

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIRT2 Q8IXJ6 1/20 0.60
SIRT1 Q96EB6 1/20 0.60
SIRT3 Q9NTG7 1/20 0.60
SIRT5 Q9NXA8 1/20 0.60
CYP1A2 P05177 6/20 0.50
CYP2A6 P11509 1/20 0.50
MTNR1A P48039 3/20 0.46
MTNR1B P49286 3/20 0.46
CYP1A1 P04798 5/20 0.44
CYP1B1 Q16678 5/20 0.44
RELA Q04206 1/20 0.42
CYP2D6 P10635 1/20 0.42
KDM4E B2RXH2 1/20 0.41
MEN1 O00255 1/20 0.41
NPC1 O15118 1/20 0.41
ALDH1A1 P00352 1/20 0.41
LMNA P02545 1/20 0.41
POLB P06746 1/20 0.41
NQO2 P16083 1/20 0.41
RAB9A P51151 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31656345 0.86 MTNR1A (0.56) SIRT2SIRT1SIRT3SIRT5CYP1A2
SCHEMBL1885376 0.86 MTNR1A (0.56) SIRT2SIRT1SIRT3SIRT5CYP1A2
SCHEMBL26969824 0.83 SIRT2 (0.45) SIRT2SIRT1SIRT3SIRT5CYP1A2
SCHEMBL29563221 0.83 SIRT2 (0.45) SIRT2SIRT1SIRT3SIRT5CYP1A2
SCHEMBL29889957 0.83 SIRT2 (0.57) SIRT2SIRT1SIRT3SIRT5CYP1A2
SCHEMBL5383981 0.83 SIRT2 (0.57) SIRT2SIRT1SIRT3SIRT5CYP1A2
SCHEMBL31618135 0.81 SIRT2 (0.52) SIRT2SIRT1SIRT3SIRT5CYP1A2
SCHEMBL15496951 0.81 CYP1A2 (0.47) SIRT2SIRT1SIRT3SIRT5CYP1A2
SCHEMBL8435209 0.80 SIRT2 (0.42) SIRT2SIRT1SIRT3SIRT5MEN1
SCHEMBL28358009 0.78 HTR2C (0.43) SIRT2SIRT1SIRT3SIRT5CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250179233-A1 PROCESS AND CATALYSTS FOR HYDROGEN MEDIATED ANIONIC COPOLYMERIZATION OF CONJUGATED DIENES AND LIQUID COPOLYMERS THEREOF ALBEMARLE CORPORATION (US) 2025-06-05 US claimed
EP-4486808-A2 PROCESS AND CATALYSTS FOR HYDROGEN MEDIATED ANIONIC COPOLYMERIZATION OF CONJUGATED DIENES AND LIQUID COPOLYMERS THEREOF ALBEMARLE CORPORATION (US) 2025-01-08 EP claimed
CN-119137172-A Process and catalyst for hydrogen-mediated anionic copolymerization of conjugated dienes and liquid copolymers thereof 雅宝公司 2024-12-13 CN claimed
WO-2023168218-A2 PROCESS AND CATALYSTS FOR HYDROGEN MEDIATED ANIONIC COPOLYMERIZATION OF CONJUGATED DIENES AND LIQUID COPOLYMERS THEREOF ALBEMARLE CORPORATION (US) 2023-09-07 WO claimed
US-20250179233-A1 PROCESS AND CATALYSTS FOR HYDROGEN MEDIATED ANIONIC COPOLYMERIZATION OF CONJUGATED DIENES AND LIQUID COPOLYMERS THEREOF ALBEMARLE CORPORATION (US) 2025-06-05 US disclosed
EP-4486808-A2 PROCESS AND CATALYSTS FOR HYDROGEN MEDIATED ANIONIC COPOLYMERIZATION OF CONJUGATED DIENES AND LIQUID COPOLYMERS THEREOF ALBEMARLE CORPORATION (US) 2025-01-08 EP disclosed
CN-119137172-A Process and catalyst for hydrogen-mediated anionic copolymerization of conjugated dienes and liquid copolymers thereof 雅宝公司 2024-12-13 CN disclosed
WO-2023168218-A2 PROCESS AND CATALYSTS FOR HYDROGEN MEDIATED ANIONIC COPOLYMERIZATION OF CONJUGATED DIENES AND LIQUID COPOLYMERS THEREOF ALBEMARLE CORPORATION (US) 2023-09-07 WO disclosed
CN-107141391-B Ethylene-polar styrene quasi-random copolymer and preparation method thereof 中国科学院长春应用化学研究所 2020-03-13 CN disclosed
US-9846360-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-19 US disclosed
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed
US-8951712-B2 Resist protective film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-10 US disclosed
US-20140178820-A1 RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed
US-20140178820-A1 RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed
US-20140080064-A1 RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-20 US disclosed
US-20140080064-A1 RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-20 US disclosed
US-20140065546-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-06 US disclosed
US-20140065546-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-06 US disclosed
US-20050283020-A1 Process for the preparation of 2-aryl propionic acids CHAUDHARI RAGHUNATH V 2005-12-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050283020-A1 Process for the preparation of 2-aryl propionic acids ADH1C, ADH5, ADH1A SIRT2 2370/4885SIRT1 3450/4885SIRT3 2298/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.