SCHEMBL18898015

SCHEMBL18898015

CCC(C)(I)C(=O)Oc1cccc2c(O)cc(O)cc12

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 11/20 0.38
▸ ESR2 Q92731 11/20 0.38
▸ MEN1 O00255 6/20 0.38
▸ KMT2A Q03164 6/20 0.38
▸ POLB P06746 1/20 0.38
▸ GAA P10253 4/20 0.36
▸ MAPT P10636 4/20 0.36
▸ HSD17B10 Q99714 2/20 0.36
▸ SMN1; SMN2 Q16637 2/20 0.36
▸ JAK2 O60674 1/20 0.36
▸ USP2 O75604 1/20 0.36
▸ ALOX15 P16050 1/20 0.36
▸ NPSR1 Q6W5P4 1/20 0.36
▸ NR1H2 P55055 1/20 0.34
▸ NR1H3 Q13133 1/20 0.34
▸ CYP1A2 P05177 3/20 0.33
▸ CYP2C9 P11712 3/20 0.33
▸ CYP2C19 P33261 3/20 0.33
▸ ALOX5 P09917 3/20 0.33
▸ CYP3A4 P08684 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15113868 0.87 ESR1 (0.39) ESR1ESR2MEN1KMT2APOLB
SCHEMBL18671983 0.87 ESR1 (0.49) ESR1ESR2MEN1KMT2APOLB
SCHEMBL20215426 0.82 NQO2 (0.43) ESR1ESR2MEN1KMT2AGAA
SCHEMBL18671905 0.81 ESR1 (0.42) ESR1ESR2MEN1KMT2APOLB
SCHEMBL18671924 0.80 ALDH1A1 (0.51) MEN1KMT2AGAAHSD17B10ALDH1A1
SCHEMBL18898053 0.80 SLC6A2 (0.37) ESR1ESR2MEN1KMT2APOLB
SCHEMBL20691763 0.78 ESR1 (0.39) ESR1ESR2MEN1KMT2APOLB
SCHEMBL18898052 0.78 NQO2 (0.38) MEN1KMT2AGAAMAPTHSD17B10
SCHEMBL18671838 0.76 ALDH1A1 (0.38) MEN1KMT2AGAAMAPTHSD17B10
SCHEMBL18898054 0.75 CA12 (0.37) KMT2APOLBGAAMAPTHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10234757-B2 Polymer, making method, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-19 — — US disclosed
US-9665002-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-30 — — US disclosed
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