SCHEMBL18898054

SCHEMBL18898054

CCC(C)(I)C(=O)Oc1cccc2cccc(O)c12

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA12 O43570 1/20 0.37
▸ CA1 P00915 1/20 0.37
▸ CA2 P00918 1/20 0.37
▸ CA7 P43166 1/20 0.37
▸ CA9 Q16790 1/20 0.37
▸ CA14 Q9ULX7 1/20 0.37
▸ NPC1 O15118 2/20 0.35
▸ RAB9A P51151 2/20 0.35
▸ MAPT P10636 2/20 0.35
▸ ELANE P08246 2/20 0.35
▸ POLB P06746 2/20 0.35
▸ GAA P10253 2/20 0.35
▸ KMT2A Q03164 1/20 0.35
▸ HTR2A P28223 2/20 0.34
▸ MAOA P21397 1/20 0.33
▸ MAOB P27338 1/20 0.33
▸ KDM4E B2RXH2 3/20 0.33
▸ HSD17B10 Q99714 2/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ PPARG P37231 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15113870 0.86 ELANE (0.36) CA12CA1CA2CA7CA9
SCHEMBL19400650 0.82 ELANE (0.51) CA2MAPTELANEPOLBGAA
SCHEMBL18671983 0.82 ESR1 (0.49) CA12CA1CA2CA7CA9
SCHEMBL18671924 0.80 ALDH1A1 (0.51) RAB9AGAAKMT2AKDM4EHSD17B10
SCHEMBL18898053 0.77 SLC6A2 (0.37) POLBGAAKMT2AMAOAMAOB
SCHEMBL20215426 0.77 NQO2 (0.43) GAAKMT2AKDM4EHSD17B10ALDH1A1
SCHEMBL18671838 0.77 ALDH1A1 (0.38) NPC1RAB9AMAPTELANEGAA
SCHEMBL20691759 0.76 CA12 (0.38) CA12CA1CA2CA7CA9
SCHEMBL18897995 0.76 ADORA2A (0.34) ELANEKMT2AKDM4EHSD17B10ALDH1A1
SCHEMBL18898015 0.75 ESR1 (0.38) NPC1MAPTELANEPOLBGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10234757-B2 Polymer, making method, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-19 — — US disclosed
US-9989847-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 — — US disclosed
US-9665002-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-30 — — US disclosed
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