SCHEMBL18897995

SCHEMBL18897995

CCC(C)(I)C(=O)Oc1cccc2ccoc12

nearest known ligand 0.35

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ ADORA2A P29274 3/20 0.34
▸ ADORA3 P0DMS8 2/20 0.34
▸ ADORA1 P30542 1/20 0.34
▸ ELANE P08246 2/20 0.33
▸ KMT2A Q03164 2/20 0.33
▸ HSD17B10 Q99714 2/20 0.33
▸ EGLN1 Q9GZT9 1/20 0.32
▸ ALDH1A1 P00352 2/20 0.32
▸ MEN1 O00255 1/20 0.32
▸ LMNA P02545 1/20 0.32
▸ HPGD P15428 1/20 0.32
▸ TMIGD3 P0DMS9 1/20 0.32
▸ CTNNB1 P35222 1/20 0.32
▸ WNT3A P56704 1/20 0.32
▸ KDM4E B2RXH2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15113849 0.86 RIPK1 (0.35) ADORA2AADORA3ADORA1ELANEKMT2A
SCHEMBL19400648 0.83 ELANE (0.49) ADORA2AADORA3ADORA1ELANEKMT2A
SCHEMBL18671924 0.78 ALDH1A1 (0.51) KMT2AHSD17B10ALDH1A1MEN1HPGD
SCHEMBL20691783 0.77 EGLN1 (0.35) ADORA2AADORA3ADORA1KMT2AHSD17B10
SCHEMBL18898054 0.76 CA12 (0.37) ELANEKMT2AHSD17B10ALDH1A1KDM4E
SCHEMBL15495778 0.75 ADORA2A (0.54) ADORA2AADORA3ADORA1KMT2AHSD17B10
SCHEMBL18671838 0.75 ALDH1A1 (0.38) ELANEKMT2AHSD17B10ALDH1A1MEN1
Trimethylammonium SCHEMBL27345077 0.74 ALOX15 (0.38) ADORA2AADORA3ADORA1KMT2AHSD17B10
SCHEMBL4714748 0.74 ADORA2A (0.41) ADORA2AADORA3ADORA1KMT2AHSD17B10
SCHEMBL18898053 0.73 SLC6A2 (0.37) KMT2AHSD17B10ALDH1A1MEN1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10234757-B2 Polymer, making method, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-19 — — US disclosed
US-9989847-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 — — US disclosed
US-9665002-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-30 — — US disclosed
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