Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACMSD | Q8TDX5 | 2/20 | 0.39 |
| ▸ | HRH3 | Q9Y5N1 | 2/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.39 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.33 |
| ▸ | HDAC2 | Q92769 | 8/20 | 0.33 |
| ▸ | HDAC1 | Q13547 | 7/20 | 0.33 |
| ▸ | HDAC3 | O15379 | 4/20 | 0.33 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.32 |
| ▸ | PSMB5 | P28074 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18905499 | 0.96 | ACMSD (0.41) | ACMSDHRH3KCNH2PTGS2HDAC2 | |
| SCHEMBL18905411 | 0.89 | HRH3 (0.40) | ACMSDHRH3KCNH2PTGS2HDAC2 | |
| SCHEMBL18905430 | 0.85 | ACMSD (0.40) | ACMSDHRH3KCNH2PTGS2HDAC2 | |
| SCHEMBL625953 | 0.77 | MAOB (0.46) | ACMSDKMT2A | |
| SCHEMBL18905447 | 0.77 | KCNH2 (0.39) | ACMSDHRH3KCNH2PTGS2HDAC2 | |
| SCHEMBL10793933 | 0.76 | ACMSD (0.53) | ACMSDHRH3KCNH2PTGS2HDAC2 | |
| SCHEMBL10829186 | 0.76 | HSD11B1 (0.43) | ACMSDHRH3KCNH2PTGS2HDAC2 | |
| SCHEMBL18905437 | 0.73 | ACMSD (0.39) | ACMSDHRH3KCNH2PTGS2HDAC2 | |
| SCHEMBL18905536 | 0.73 | ACMSD (0.44) | ACMSDHRH3KCNH2PTGS2HDAC2 | |
| SCHEMBL8885877 | 0.72 | ACMSD (0.44) | ACMSDHRH3KCNH2PTGS2HDAC2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170154766-A1 | SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-01 | — | — | US | disclosed |