SCHEMBL18911045

SCHEMBL18911045

C=C(C)c1ccc(OCC)c2ccccc12

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CNR2 P34972 8/20 0.48
▸ CNR1 P21554 4/20 0.44
▸ CYP2C9 P11712 1/20 0.43
▸ ALDH1A1 P00352 6/20 0.42
▸ HPGD P15428 4/20 0.42
▸ LMNA P02545 3/20 0.42
▸ NPSR1 Q6W5P4 2/20 0.42
▸ MAPT P10636 1/20 0.42
▸ ALOX12 P18054 1/20 0.42
▸ NTSR1 P30989 1/20 0.42
▸ CCR6 P51684 1/20 0.42
▸ MCL1 Q07820 1/20 0.42
▸ HTT P42858 3/20 0.42
▸ MEN1 O00255 2/20 0.42
▸ KMT2A Q03164 2/20 0.42
▸ HPGDS O60760 1/20 0.41
▸ HSD17B10 Q99714 1/20 0.41
▸ TSHR P16473 2/20 0.40
▸ MCOLN3 Q8TDD5 1/20 0.40
▸ THRA P10827 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18905395 0.85 CNR2 (0.40) CNR2CNR1CYP2C9ALDH1A1HTT
SCHEMBL18911126 0.84 CNR2 (0.47) CNR2CNR1CYP2C9LMNAMAPT
SCHEMBL7905505 0.83 CNR2 (0.54) CNR2CNR1CYP2C9ALDH1A1HPGD
SCHEMBL50817 0.81 ALDH1A1 (0.54) CNR2ALDH1A1HPGDLMNANPSR1
SCHEMBL29378631 0.81 ALDH1A1 (0.54) CNR2ALDH1A1HPGDLMNANPSR1
SCHEMBL1869452 0.79 CNR2 (0.54) CNR2CNR1CYP2C9LMNAKMT2A
SCHEMBL21955458 0.79 L3MBTL1 (0.36) ALDH1A1HPGDLMNANPSR1MAPT
SCHEMBL4952648 0.78 HCRTR1 (0.54) ALDH1A1HPGDLMNANPSR1MAPT
SCHEMBL5232608 0.78 CNR2 (0.53) CNR2CNR1CYP2C9ALDH1A1HPGD
SCHEMBL11171232 0.78 CNR2 (0.53) CNR2CNR1CYP2C9ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170154766-A1 SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-01 — — US disclosed
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