Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | KCNQ3 | O43525 | 1/20 | 0.33 |
| ▸ | KCNQ2 | O43526 | 1/20 | 0.33 |
| ▸ | KCNQ4 | P56696 | 1/20 | 0.33 |
| ▸ | KCNQ5 | Q9NR82 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18467938 | 0.91 | POLB (0.39) | POLBL3MBTL1HPGDKCNQ3KCNQ2 | |
| SCHEMBL2632930 | 0.81 | POLB (0.41) | POLBL3MBTL1HPGDKCNQ3KCNQ2 | |
| SCHEMBL25889181 | 0.77 | POLB (0.37) | POLBL3MBTL1HPGDKCNQ3KCNQ2 | |
| SCHEMBL17955662 | 0.76 | HSD11B1 (0.32) | POLBHSD11B1 | |
| SCHEMBL26190807 | 0.75 | POLB (0.36) | POLBL3MBTL1HPGDKCNQ3KCNQ2 | |
| SCHEMBL22043918 | 0.75 | HSD11B1 (0.32) | POLBHSD11B1 | |
| SCHEMBL26190677 | 0.73 | POLB (0.35) | POLBL3MBTL1KCNQ3KCNQ2KCNQ4 | |
| SCHEMBL7647666 | 0.73 | POLB (0.52) | POLBL3MBTL1HPGDKCNQ3KCNQ2 | |
| SCHEMBL7647668 | 0.73 | POLB (0.52) | POLBL3MBTL1HPGDKCNQ3KCNQ2 | |
| SCHEMBL85684 | 0.73 | POLB (0.44) | POLBL3MBTL1HPGDKCNQ3KCNQ2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9671693-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |