Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16572698 | 0.88 | — | — | |
| SCHEMBL2876132 | 0.85 | HTT (0.41) | HTT | |
| SCHEMBL23057234 | 0.84 | HTT (0.35) | HTT | |
| SCHEMBL17055704 | 0.84 | HTT (0.35) | HTT | |
| SCHEMBL18924493 | 0.83 | HTT (0.34) | HTT | |
| SCHEMBL19772643 | 0.82 | HTT (0.35) | HTT | |
| SCHEMBL24804093 | 0.82 | — | — | |
| SCHEMBL19132670 | 0.81 | ADRA2A (0.32) | — | |
| SCHEMBL2611421 | 0.81 | MEN1 (0.32) | — | |
| SCHEMBL17150775 | 0.80 | HTT (0.39) | HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11550219-B2 | Salt, quencher, resist composition and method for producing resist pattern, and method for producing salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-10 | — | — | US | disclosed |
| US-11378883-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-07-05 | — | — | US | disclosed |
| US-20220206383-A2 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-06-30 | — | — | US | disclosed |
| US-11327399-B2 | Photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-05-10 | — | — | US | disclosed |
| US-20210389669-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-16 | — | — | US | disclosed |
| US-20210371376-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-02 | — | — | US | disclosed |
| US-20200385343-A1 | SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING SALT | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-12-10 | — | — | US | disclosed |
| US-10774029-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-15 | — | — | US | disclosed |
| US-20190317402-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-10-17 | — | — | US | disclosed |
| US-20190025698-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-01-24 | — | — | US | disclosed |
| US-9726974-B2 | Resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9671692-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210389669-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, AFF1, AFF4 | HTT 3191/4885 |
| US-20210371376-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-10, H1-0, OXSR1 | HTT 3575/4885 |
| US-11550219-B2 | Salt, quencher, resist composition and method for producing resist pattern, and method for producing salt | NHERF1, AFF4, RER1 | HTT 1389/4885 |
| US-20200385343-A1 | SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING SALT | NHERF1, RER1, AFF4 | HTT 1380/4885 |
| US-20190025698-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | C1R, C9, RER1 | HTT 3231/4885 |
| US-10774029-B2 | Compound, resin, resist composition and method for producing resist pattern | C1R, C9, RER1 | HTT 3232/4885 |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | HTT 3191/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.