SCHEMBL1896572

SCHEMBL1896572

C=Cc1ccccc1C(=O)OCCO

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 4/20 0.50
ALDH1A1 P00352 8/20 0.47
TSHR P16473 10/20 0.46
TDP1 Q9NUW8 4/20 0.45
L3MBTL1 Q9Y468 3/20 0.45
HSD17B10 Q99714 4/20 0.44
MAPK1 P28482 3/20 0.44
TP53 P04637 2/20 0.44
LMNA P02545 1/20 0.42
NPC1 O15118 3/20 0.40
HPGD P15428 2/20 0.40
RAB9A P51151 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
GLA P06280 1/20 0.40
HIF1A Q16665 1/20 0.40
KDM4E B2RXH2 1/20 0.39
MEN1 O00255 1/20 0.39
NFKB1 P19838 1/20 0.39
NFKB2 Q00653 1/20 0.39
KMT2A Q03164 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5064752 0.88 TSHR (0.53) CYP3A4ALDH1A1TSHRTDP1L3MBTL1
SCHEMBL4371870 0.87 CYP3A4 (0.50) CYP3A4ALDH1A1TSHRTDP1L3MBTL1
SCHEMBL29030397 0.86 CYP3A4 (0.53) CYP3A4ALDH1A1TSHRTDP1L3MBTL1
SCHEMBL1897234 0.85 CYP3A4 (0.49) CYP3A4ALDH1A1TSHRTDP1L3MBTL1
SCHEMBL4905609 0.85 ALDH1A1 (0.69) CYP3A4ALDH1A1TSHRTDP1L3MBTL1
SCHEMBL1397837 0.83 TSHR (0.71) CYP3A4ALDH1A1TSHRTDP1L3MBTL1
SCHEMBL36533 0.82 ALDH1A1 (0.67) CYP3A4ALDH1A1TSHRTDP1L3MBTL1
SCHEMBL4905671 0.81 SCN1A (0.47) CYP3A4ALDH1A1TSHRTDP1L3MBTL1
SCHEMBL4906053 0.81 TSHR (0.49) CYP3A4ALDH1A1TSHRTDP1L3MBTL1
SCHEMBL1900819 0.81 TSHR (0.57) CYP3A4ALDH1A1TSHRTDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed
US-4192684-A Photosensitive compositions containing hydrogenated 1,2-polybutadiene ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1980-03-11 US disclosed
US-4006024-A Photosensitive compositions comprising a polyester-polyether block polymer ASAHI KASEI KOGYO KABUSHIKI KAISHA (JA) 1977-02-01 US disclosed
US-3960572-A Photosensitive compositions comprising a polyester-polyether block polymer ASAHI KASEI KOGYO KABUSHIKI KAISHA (JA) 1976-06-01 US disclosed