SCHEMBL189740

SCHEMBL189740

ClCn1nnc2ccccc21

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC9A1 P19634 9/20 0.68
GRM2 Q14416 2/20 0.67
TDP1 Q9NUW8 1/20 0.61
RAB9A P51151 3/20 0.58
NPC1 O15118 2/20 0.58
MAPT P10636 1/20 0.58
TSHR P16473 2/20 0.56
GLA P06280 1/20 0.56
KCNMA1 Q12791 1/20 0.54
EGLN3 Q9H6Z9 1/20 0.54
APAF1 O14727 1/20 0.54
POLB P06746 1/20 0.54
MGAM O43451 1/20 0.53
AMY1A P0DUB6 1/20 0.53
GAA P10253 1/20 0.53
SI P14410 1/20 0.53
MGAM2 Q2M2H8 1/20 0.53
KDM4E B2RXH2 1/20 0.53
HPGD P15428 1/20 0.53
HSD17B10 Q99714 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5637028 0.84 SLC9A1 (0.80) SLC9A1GRM2TDP1RAB9ANPC1
SCHEMBL1774497 0.83 SLC9A1 (0.70) SLC9A1GRM2TDP1RAB9ANPC1
SCHEMBL31234269 0.83 SLC9A1 (0.70) SLC9A1GRM2TDP1RAB9ANPC1
SCHEMBL318888 0.81 SLC9A1 (1.00) SLC9A1GRM2TDP1RAB9ANPC1
SCHEMBL2734889 0.80 GRM2 (1.00) SLC9A1GRM2TDP1RAB9ANPC1
SCHEMBL17103011 0.80 SLC9A1 (0.90) SLC9A1GRM2TDP1RAB9ANPC1
SCHEMBL251561 0.79 SLC9A1 (0.66) SLC9A1GRM2TDP1RAB9ANPC1
SCHEMBL18306880 0.79 SLC9A1 (0.66) SLC9A1GRM2TDP1RAB9ANPC1
SCHEMBL3259919 0.79 SLC9A1 (0.66) SLC9A1GRM2TDP1RAB9ANPC1
SCHEMBL3107127 0.79 SLC9A1 (0.66) SLC9A1GRM2TDP1RAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 440 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12590224-B2 Chemical mechanical polishing compositions and methods of use thereof FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2026-03-31 US claimed
US-20260042976-A1 COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM ELECTRONIC MAT USA INC (US) 2026-02-12 US claimed
EP-4647474-A2 CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM Electronic Materials U.S.A., Inc. (US) 2025-11-12 EP claimed
EP-4562104-A1 COMPOSITIONS AND METHODS OF USE THEREOF Fujifilm Electronic Materials U.S.A., Inc. (US) 2025-06-04 EP claimed
CN-119955150-A Flame-retardant tarpaulin material and preparation method thereof 泰州海本蓬网有限公司 2025-05-09 CN claimed
CN-118414401-A Polishing composition and method of use 富士胶片电子材料美国有限公司 2024-07-30 CN claimed
EP-4396299-A1 POLISHING COMPOSITIONS AND METHODS OF USING THE SAME Fujifilm Electronic Materials U.S.A., Inc. (US) 2024-07-10 EP claimed
EP-4381022-A1 COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM Electronic Materials U.S.A., Inc. (US) 2024-06-12 EP claimed
CN-114945649-B Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2024-05-07 CN claimed
CN-117800952-A Dual-functional ionic liquid, preparation method and application thereof, and synthetic ester lubricating oil 中国科学院兰州化学物理研究所 2024-04-02 CN claimed
EP-1255797-B1 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES OMG ELECTRONIC CHEMICALS INC (US) 2012-06-13 EP claimed
JP-4754752-B2 2011-08-24 JP claimed
EP-1255797-A4 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES ELECTROCHEMICALS INC (US) 2009-01-14 EP claimed
EP-2014797-A2 Coating composition for interconnection part of electrode and plasma display panel including the same Samsung SDI Co., Ltd. (KR) 2009-01-14 EP claimed
US-20080303439-A1 Coating composition for interconnection part of electrode and plasma display panel including the same SAMSUNG SDI CO., LTD., A CORP. OF THE REPUBLIC OF KOREA (KR) 2008-12-11 US claimed
CN-100340632-C Method for roughening copper surfaces for bonding to substrates ELECTROCHEMICALS INC (US) 2007-10-03 CN claimed
CN-1451031-A Method for roughening copper surfaces for bonding to substrates ELECTROCHEMICALS INC (US) 2003-10-22 CN claimed
JP-2003519286-A 2003-06-17 JP claimed
EP-1255797-A1 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES ELECTROCHEMICALS INC. (US) 2002-11-13 EP claimed
WO-2001049805-A1 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES ELECTROCHEMICALS INC. (US) 2001-07-12 WO claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12590224-B2 Chemical mechanical polishing compositions and methods of use thereof PHOSPHO1, ACP1, PLEC SLC9A1 587/4885GRM2 2651/4885TDP1 1376/4885
US-20260042976-A1 COMPOSITIONS AND METHODS OF USE THEREOF ACP1, PLOD1, CA1 SLC9A1 450/4885GRM2 54/4885TDP1 1742/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.