SCHEMBL1897704

SCHEMBL1897704

C=COC(=O)c1ccccc1C(C)OC(C)C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.39
TSHR P16473 6/20 0.36
ALDH1A1 P00352 4/20 0.36
HSD17B10 Q99714 2/20 0.35
IRAK4 Q9NWZ3 1/20 0.34
NPC1 O15118 1/20 0.33
KCNK3 O14649 1/20 0.33
KCNK9 Q9NPC2 1/20 0.33
TDP1 Q9NUW8 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
KDM4E B2RXH2 2/20 0.31
HPGD P15428 1/20 0.31
PDCD1 Q15116 1/20 0.31
CD274 Q9NZQ7 1/20 0.31
TP53 P04637 1/20 0.31
MAPK1 P28482 1/20 0.31
LMNA P02545 1/20 0.31
GAA P10253 1/20 0.31
KMT2A Q03164 1/20 0.31
ATM Q13315 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1895796 0.86 TSHR (0.37) CYP3A4TSHRALDH1A1HSD17B10KCNK3
SCHEMBL1897089 0.86 ALDH1A1 (0.36) CYP3A4TSHRALDH1A1HSD17B10TDP1
SCHEMBL1899419 0.82 TSHR (0.34) CYP3A4TSHRALDH1A1HSD17B10TDP1
SCHEMBL1897724 0.82 TSHR (0.40) CYP3A4TSHRALDH1A1HSD17B10TDP1
SCHEMBL1899632 0.81 ALDH1A1 (0.46) CYP3A4TSHRALDH1A1HSD17B10NPC1
SCHEMBL1901755 0.80 ALDH1A1 (0.43) CYP3A4TSHRALDH1A1HSD17B10TDP1
SCHEMBL1899087 0.78 TSHR (0.34) CYP3A4TSHRALDH1A1HSD17B10TDP1
SCHEMBL1903570 0.77 LMNA (0.38) ALDH1A1HSD17B10NPC1KDM4EHPGD
SCHEMBL15175 0.76 CYP3A4 (0.55) CYP3A4TSHRALDH1A1HSD17B10NPC1
SCHEMBL1899943 0.76 CYP3A4 (0.36) CYP3A4TSHRALDH1A1HSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed