SCHEMBL1898448

SCHEMBL1898448

C=C(C)C(=O)OC(O)C(C)(C)C

nearest known ligand 0.42

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.42
TSHR P16473 3/20 0.39
THRB P10828 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
ELANE P08246 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Urethane SCHEMBL11874609 0.83 ALOX15 (0.47) ALDH1A1TSHRTHRBTDP1
SCHEMBL28886816 0.80 ALDH1A1 (0.41) ALDH1A1TSHRTHRBELANE
SCHEMBL7767144 0.79 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL372920 0.79 ALDH1A1 (0.44) ALDH1A1TSHRTHRBTDP1
SCHEMBL3081441 0.77 TSHR (0.43) ALDH1A1TSHRTHRBTDP1
SCHEMBL28194319 0.77 ALDH1A1 (0.42) ALDH1A1TSHRTHRBTDP1
SCHEMBL11437995 0.77 ALDH1A1 (0.42) ALDH1A1TSHRTHRBTDP1
SCHEMBL31539522 0.77 TSHR (0.39) ALDH1A1TSHRTHRBELANE
SCHEMBL7772732 0.77 ALDH1A1 (0.34) ALDH1A1TSHR
SCHEMBL9933052 0.77 TSHR (0.44) ALDH1A1TSHRTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104749884-B Photosensitive polymer combination 东京应化工业株式会社 2019-10-18 CN disclosed
CN-110317174-A Hydrogen barrier, hydrogen barrier film, which are formed, uses composition, hydrogen barrier film, the manufacturing method of hydrogen barrier film and electronic component 东京应化工业株式会社 2019-10-11 CN disclosed
CN-107903156-B Photosensitive composite and compound 东京应化工业株式会社 2019-05-31 CN disclosed
CN-104371372-B Dispersible pigment dispersion, photosensitive polymer combination and dispersing aid containing the dispersible pigment dispersion 东京应化工业株式会社 2019-03-19 CN disclosed
CN-109471330-A Photosensitive composite and Photoepolymerizationinitiater initiater used in it 东京应化工业株式会社 2019-03-15 CN disclosed
CN-109426079-A Photosensitive composite, solidfied material forming method, solidfied material, device used for image display panel and image display device 东京应化工业株式会社 2019-03-05 CN disclosed
CN-109283792-A Photosensitive composite, pattern forming method, solidfied material and display device 东京应化工业株式会社 2019-01-29 CN disclosed
US-9903021-B2 Method for using 3-coat-1-bake waterborne coating composition AXALTA COATINGS SYSTEMS IP CO., LLC (US) 2018-02-27 US disclosed
EP-2373750-B1 METHOD FOR USING 3-COAT-1-BAKE WATERBORNE COATING COMPOSITION COATINGS FOREIGN IP CO LLC (US) 2017-11-22 EP disclosed
US-9725545-B2 Porous polymeric resins 3M INNOVATIVE PROPERTIES COMPANY (US) 2017-08-08 US disclosed
US-20080305347-A1 Protective coating and a coated substrate obtained therefrom E. I. DU PONT DE NEMOURS AND COMPANY 2008-12-11 US disclosed
US-20080306206-A1 Saturant and fiber composite structure NEUMANN DANIEL LEE 2008-12-11 US disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed
WO-2008066381-A1 HYDROGEL CONTACT LENS COMPRISING A POLYMER COMPRISING A CARBOXY BETAINE ESTER MONOMER PROCORNEA HOLDING B.V. (NL) 2008-06-05 WO disclosed
EP-0671660-B1 Lead-frame forming material FUJI PHOTO FILM CO LTD (JP) 2001-10-17 EP disclosed
EP-1077392-A1 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2001-02-21 EP disclosed
US-5670293-A LIGHT SENSITIVE MATERIAL WITH COPPER OR NICKEL ALLOYS, DRYING A PHOTOSENSITIVE LAYER AND WINDING THE COATED WEB INTO STRIPS AND STACKING FUJI PHOTO FILM CO., LTD. (JP) 1997-09-23 US disclosed
EP-0671660-A2 Lead-frame forming material FUJI PHOTO FILM CO., LTD. (JP) 1995-09-13 EP disclosed
US-4028435-A IN THE PRESENCE OF AN ORGANOPHOSPHORUS COMPOUND, ATERTIARY AMINE AND AN ARYL HALIDE IDEMITSU KOSAN CO., LTD. (JA) 1977-06-07 US disclosed
US-3954714-A Polymerizable urethane compounds and polymers thereof ICI UNITED STATES INC. (US) 1976-05-04 US disclosed