SCHEMBL1901758

SCHEMBL1901758

C=Cc1ccccc1C(=O)OCC(C)CC

nearest known ligand 0.51

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.51
TSHR P16473 5/20 0.51
MAPT P10636 1/20 0.49
CYP3A4 P08684 3/20 0.46
CA2 P00918 1/20 0.46
PRSS1 P07477 1/20 0.44
PRSS2 P07478 1/20 0.44
PRSS3 P35030 1/20 0.44
ADRB2 P07550 6/20 0.44
ADRB1 P08588 6/20 0.44
ADRB3 P13945 6/20 0.44
LMNA P02545 1/20 0.42
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
HSD17B10 Q99714 2/20 0.39
TP53 P04637 1/20 0.39
MAPK1 P28482 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1895681 0.89 ALDH1A1 (0.49) ALDH1A1TSHRCYP3A4CA2PRSS1
SCHEMBL1897184 0.87 ALDH1A1 (0.57) ALDH1A1TSHRCYP3A4CA2PRSS1
SCHEMBL4903411 0.87 ALDH1A1 (0.70) ALDH1A1TSHRMAPTCYP3A4CA2
SCHEMBL29030384 0.87 ALDH1A1 (0.56) ALDH1A1TSHRMAPTCYP3A4CA2
SCHEMBL1895179 0.87 ALDH1A1 (0.54) ALDH1A1TSHRCYP3A4CA2PRSS1
SCHEMBL1897807 0.86 ALDH1A1 (0.46) ALDH1A1TSHRCYP3A4CA2PRSS1
SCHEMBL4452946 0.85 TSHR (0.70) ALDH1A1TSHRMAPTCYP3A4CA2
SCHEMBL30385424 0.82 TSHR (0.67) ALDH1A1TSHRMAPTCYP3A4LMNA
SCHEMBL2002577 0.82 TSHR (0.67) ALDH1A1TSHRMAPTCYP3A4LMNA
SCHEMBL11513723 0.80 ALDH1A1 (0.80) ALDH1A1TSHRMAPTCYP3A4CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US claimed
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed