⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25946787 | 0.90 | POLB (0.31) | — | |
| SCHEMBL26445968 | 0.90 | — | — | |
| SCHEMBL22940980 | 0.90 | — | — | |
| SCHEMBL10262727 | 0.88 | ALDH1A1 (0.31) | — | |
| SCHEMBL9244154 | 0.88 | HMGCR (0.38) | — | |
| SCHEMBL20048860 | 0.87 | — | — | |
| SCHEMBL18844966 | 0.86 | — | — | |
| SCHEMBL22279216 | 0.85 | — | — | |
| SCHEMBL25564584 | 0.85 | LMNA (0.32) | — | |
| SCHEMBL17612323 | 0.84 | HMGCR (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210302838-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-30 | — | — | US | disclosed |
| US-9958776-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-01 | — | — | US | disclosed |
| US-20170184964-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170174922-A1 | CONDUCTIVE MATERIAL AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-22 | — | — | US | disclosed |