Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 4/20 | 0.38 |
| ▸ | CYP17A1 | P05093 | 3/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | NAAA | Q02083 | 1/20 | 0.33 |
| ▸ | STS | P08842 | 2/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | CA12 | O43570 | 3/20 | 0.31 |
| ▸ | CA9 | Q16790 | 3/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL686582 | 0.86 | CYP19A1 (0.40) | CA2CYP19A1CYP17A1NPSR1TSHR | |
| SCHEMBL10168175 | 0.83 | CYP19A1 (0.41) | CA2CYP19A1CYP17A1NPSR1TSHR | |
| SCHEMBL17522547 | 0.82 | CYP19A1 (0.37) | CA2CYP19A1CYP17A1NPSR1TSHR | |
| SCHEMBL17525074 | 0.82 | CYP19A1 (0.37) | CA2CYP19A1CYP17A1NPSR1TSHR | |
| SCHEMBL17068034 | 0.81 | CYP19A1 (0.39) | CA2CYP19A1CYP17A1NPSR1TSHR | |
| SCHEMBL9764361 | 0.78 | CYP19A1 (0.43) | CA2CYP19A1CYP17A1NPSR1TSHR | |
| SCHEMBL17522560 | 0.77 | TSHR (0.40) | CA2CYP19A1CYP17A1NPSR1TSHR | |
| SCHEMBL14294660 | 0.77 | ALDH1A1 (0.35) | CA2CYP19A1CYP17A1 | |
| SCHEMBL21392229 | 0.76 | CYP19A1 (0.34) | CA2CYP19A1CYP17A1NPSR1TSHR | |
| SCHEMBL17522556 | 0.76 | EPHX2 (0.38) | CA2CYP19A1CYP17A1NPSR1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20170184962-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170184964-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170184963-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |