SCHEMBL1904651

SCHEMBL1904651

C=C(C)C(=O)OCc1cccc(O)c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.44
ENPP2 Q13822 1/20 0.43
TYR P14679 1/20 0.42
SPR P35270 1/20 0.42
CYP3A4 P08684 2/20 0.42
CHRM2 P08172 1/20 0.41
CHRM1 P11229 1/20 0.41
CHRM3 P20309 1/20 0.41
DRD2 P14416 1/20 0.41
DRD1 P21728 1/20 0.41
TAAR1 Q96RJ0 1/20 0.41
CTBP2 P56545 1/20 0.41
GABRA1 P14867 1/20 0.41
GABRG2 P18507 1/20 0.41
GABRB3 P28472 1/20 0.41
GABRA3 P34903 1/20 0.41
GABRA2 P47869 1/20 0.41
GABRB2 P47870 1/20 0.41
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10322053 0.91 ALDH1A1 (0.48) ALDH1A1CYP3A4RAB9AMAPK1
Benzoic Acid SCHEMBL28244407 0.90 CA12 (0.46) ALDH1A1NPC1RAB9ACA12CA1
SCHEMBL31744941 0.86 TYR (0.56) TYRSPRCHRM2CHRM1CHRM3
SCHEMBL1119153 0.86 TYR (0.56) TYRSPRCHRM2CHRM1CHRM3
SCHEMBL28197894 0.85 ALDH1A1 (0.43) ALDH1A1NPC1RAB9A
SCHEMBL4361517 0.85 ALDH1A1 (0.43) ALDH1A1NPC1RAB9A
SCHEMBL10724696 0.85 MAOB (0.52) ALDH1A1CTBP2
SCHEMBL9555001 0.85 ALDH1A1 (0.43) ALDH1A1CYP3A4RAB9A
SCHEMBL23750151 0.84 MMP1 (0.44) ALDH1A1ENPP2
SCHEMBL21112022 0.84 HCAR2 (0.55) RAB9ACYP1A2MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4667537-A1 PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-12-24 EP disclosed
US-20250382500-A1 PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE TOKYO OHKA KOGYO CO LTD (JP) 2025-12-18 US disclosed
CN-114292226-B Compound with hydroxamic acid structure and preparation method and application thereof 沈阳药科大学 2023-04-18 CN disclosed
CN-114292226-A Compound with hydroxamic acid structure and preparation method and application thereof 沈阳药科大学 2022-04-08 CN disclosed
CN-109929070-B Acrylate secondary monomer and copolymer obtained by polymerizing same 复旦大学 2021-07-27 CN disclosed
CN-112346302-A Positive photosensitive resin composition, method for forming patterned resist film, and patterned resist film 东京应化工业株式会社 2021-02-09 CN disclosed
WO-2015126666-A1 DENTAL COMPOSITION AND USE THEREOF 3M INNOVATIVE PROPERTIES COMPANY (US) 2015-08-27 WO disclosed
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
US-4535045-A WITH UNSATURATED CARBOXYLATED MONOMER AND UINYL MONOMER WITH HYDROXYL GROUP FUJI PHOTO FILM CO., LTD. (JP) 1985-08-13 US disclosed
US-4058443-A PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN FUJI PHOTO FILM CO., LTD. (JA) 1977-11-15 US disclosed