SCHEMBL19052016

SCHEMBL19052016

c1ccc(N2CCN3CCN(c4ccccc4)C2N(c2ccccc2)CC3)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.47
NPSR1 Q6W5P4 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.46
MAPK1 P28482 2/20 0.43
HTT P42858 1/20 0.43
KDM4E B2RXH2 1/20 0.40
ALDH1A1 P00352 1/20 0.40
TSHR P16473 1/20 0.40
USP30 Q70CQ3 1/20 0.40
SIGMAR1 Q99720 2/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38
SLC6A2 P23975 1/20 0.37
SLC6A4 P31645 1/20 0.37
SLC6A3 Q01959 1/20 0.37
HTR3E A5X5Y0 1/20 0.37
HTR3B O95264 1/20 0.37
ADRB1 P08588 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9668731 0.77 MAPT (0.52) MAPTNPSR1SMN1; SMN2MAPK1HTT
SCHEMBL12254378 0.73 MAPK1 (0.49) MAPTNPSR1SMN1; SMN2MAPK1HTT
Hydrochloric Acid SCHEMBL7772081 0.71 MAPT (0.47) MAPTNPSR1SMN1; SMN2MAPK1HTT
SCHEMBL11542018 0.71 MAPT (0.47) MAPTNPSR1SMN1; SMN2MAPK1HTT
SCHEMBL5346985 0.70 KCNH2 (0.50) HTR3ACHRNA7
SCHEMBL1012009 0.68 MAPT (0.44) MAPTNPSR1SMN1; SMN2MAPK1HTT
SCHEMBL4526944 0.68 NOTUM (0.47) MAPTNPSR1SMN1; SMN2MAPK1HTT
SCHEMBL17982700 0.68 MAPT (0.44) MAPTNPSR1SMN1; SMN2MAPK1HTT
SCHEMBL1010855 0.68 MAPT (0.49) MAPTNPSR1SMN1; SMN2MAPK1HTT
SCHEMBL7263182 0.67 MAPT (0.42) MAPTNPSR1SMN1; SMN2MAPK1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
US-20180081267-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-22 US disclosed
US-20180081266-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-22 US disclosed
US-9897914-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-02-20 US disclosed
US-20170184963-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed