Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL191695 | 0.85 | EPHX2 (0.30) | — | |
| SCHEMBL7099142 | 0.83 | EPHX2 (0.33) | — | |
| SCHEMBL28205428 | 0.81 | SPHK1 (0.35) | — | |
| SCHEMBL39663 | 0.80 | TSHR (0.32) | — | |
| SCHEMBL27517386 | 0.78 | TSHR (0.31) | — | |
| SCHEMBL27509111 | 0.72 | — | — | |
| Magnesium Chloride Anhydrous SCHEMBL27528820 | 0.72 | — | — | |
| Adamantane SCHEMBL1071737 | 0.69 | L3MBTL1 (0.37) | — | |
| SCHEMBL9231484 | 0.69 | EPHX2 (0.32) | — | |
| SCHEMBL4881290 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 203 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8722321-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-13 | — | — | US | claimed |
| US-20120276485-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-01 | — | — | US | claimed |
| US-20120270159-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-25 | — | — | US | claimed |
| EP-2287671-B1 | Process for forming a coated substrate | COMMW SCIENT IND RES ORG (AU) | 2012-06-06 | — | — | EP | claimed |
| US-20100239982-A1 | Photoresist composition with high etching resistance | CHEIL INDUSTRIES, INC. (KR) | 2010-09-23 | — | — | US | claimed |
| US-20100233620-A1 | Copolymer and photoresist composition including the same | CHEIL INDUSTRIES, INC. (KR) | 2010-09-16 | — | — | US | claimed |
| US-7604918-B2 | Photosensitive polymer and photoresist composition having the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-10-20 | — | — | US | claimed |
| WO-2009069847-A1 | PHOTORESIST COMPOSITION WITH HIGH ETCHING RESISTANCE | CHEIL INDUSTRIES INC. (KR) | 2009-06-04 | — | — | WO | claimed |
| WO-2009069848-A1 | NOVEL COPOLYMERS AND PHOTORESIST COMPOSITION INCLUDING THE SAME | CHEIL INDUSTRIES INC. (KR) | 2009-06-04 | — | — | WO | claimed |
| US-20070172760-A1 | Photosensitive polymer and photoresist composition having the same | SAMSUNG ELECTRONICS CO. LTD | 2007-07-26 | — | — | US | claimed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | claimed |
| US-6849378-B2 | Photosensitive polymers, resist compositions comprising the same, and methods for forming photoresistive patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-02-01 | — | — | US | claimed |
| US-6833230-B2 | Good adhesion and resistance to dry etching | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-12-21 | — | — | US | claimed |
| US-6777162-B2 | 10-90 MOL % OF AN ALKYL VINYL ETHER MONOMER AND 10-90 MOL % OF ACRYLATE, METHACRYLATE, FUMARATE AND 4-HYDROXYSTYRENE DERIVATIVES | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-08-17 | — | — | US | claimed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | claimed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | claimed |
| US-20030224289-A1 | Photosensitive polymers and resist compositions containing the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-12-04 | — | — | US | claimed |
| US-20030203306-A1 | Photosensitive polymers, resist compositions comprising the same, and methods for forming photoresistive patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-10-30 | — | — | US | claimed |
| US-20030194643-A1 | Photosensitive polymers containing adamantylalkyl vinyl ether, and resist compositions including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-10-16 | — | — | US | claimed |
| US-20030091928-A1 | Photosensitive polymer and photoresist composition thereof | SAMSUNG ELECTRONICS, CO., LTD. (KR) | 2003-05-15 | — | — | US | claimed |