Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7099142 | 0.93 | EPHX2 (0.33) | EPHX2 | |
| SCHEMBL190681 | 0.85 | HSD11B1 (0.31) | — | |
| SCHEMBL39663 | 0.76 | TSHR (0.32) | — | |
| SCHEMBL9231484 | 0.74 | EPHX2 (0.32) | EPHX2 | |
| SCHEMBL17508775 | 0.72 | — | — | |
| SCHEMBL6597034 | 0.67 | TSHR (0.36) | — | |
| SCHEMBL6597029 | 0.67 | TSHR (0.31) | — | |
| Adamantane SCHEMBL1071737 | 0.66 | L3MBTL1 (0.37) | EPHX2 | |
| SCHEMBL5398625 | 0.66 | SPHK1 (0.30) | — | |
| SCHEMBL4881290 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7261992-B2 | Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-08-28 | — | — | US | claimed |
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | claimed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | claimed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | claimed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | claimed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | claimed |
| US-20240069440-A1 | PHOTORESIST FILM AND APPLICATION THEREOF | CHANG CHUN PLASTICS CO., LTD. (TW) | 2024-02-29 | — | — | US | disclosed |
| CN-109799680-B | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2023-03-10 | — | — | CN | disclosed |
| WO-2021002375-A1 | SEALANT FOR ORGANIC EL DISPLAY ELEMENT | 積水化学工業株式会社 | 2021-01-07 | — | — | WO | disclosed |
| CN-109799680-A | Chemical amplification positive photosensitive resin composition and its application | 奇美实业股份有限公司 | 2019-05-24 | — | — | CN | disclosed |
| EP-1708027-B1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2019-03-13 | — | — | EP | disclosed |
| CN-107848947-A | Fluorochemical, living polymerization initiator, fluoropolymer, the manufacture method of fluoropolymer and anti-corrosion agent composition | DIC株式会社 | 2018-03-27 | — | — | CN | disclosed |
| US-20160070162-A1 | OPTICAL MASK AND METHOD OF MANUFACTURING THE OPTICAL MASK | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-03-10 | — | — | US | disclosed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | disclosed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | disclosed |
| CN-1429195-A | Process for producing 2-alkyl-2-adamantyl ester | TOKUYAMA CORP (JP) | 2003-07-09 | — | — | CN | disclosed |
| US-20030120106-A1 | Reacting a solution of a lithium 2-alkyl-2-adamantyl alcoholate to a (meth)acryloyl halide to produce 2-alkyl-2-admantyl (meth)acrylate | TOKUYAMA CORPORATION (JP) | 2003-06-26 | — | — | US | disclosed |
| EP-1283198-A1 | PROCESS FOR PRODUCING 2-ALKYL-2-ADAMANTYL ESTER | TOKUYAMA CORPORATION (JP) | 2003-02-12 | — | — | EP | disclosed |
| US-20020090572-A1 | Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications | GLOBALFOUNDRIES U.S. INC. | 2002-07-11 | — | — | US | disclosed |
| US-20020081520-A1 | Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications | GLOBALFOUNDRIES INC. (KY) | 2002-06-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030120106-A1 | Reacting a solution of a lithium 2-alkyl-2-adamantyl alcoholate to a (meth)acryloyl halide to produce 2-alkyl-2-admantyl (meth)acrylate | ADH1A, ADH5, ANO2 | EPHX2 3443/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.